EP 1050069 A1 20001108 - DEVICE AND METHOD FOR TREATING SUBSTRATES
Title (en)
DEVICE AND METHOD FOR TREATING SUBSTRATES
Title (de)
VORRICHTUNG UND VERFAHREN ZUR BEHANDLUNG VON SUBSTRATEN
Title (fr)
DISPOSITIF ET PROCEDE POUR LE TRAITEMENT DE SUBSTRATS
Publication
Application
Priority
- DE 19802579 A 19980123
- EP 9808469 W 19981228
Abstract (en)
[origin: DE19802579A1] A substrate treatment apparatus has a substrate raising and lowering device (20), the speed or stroke of which is variable in accordance with the substrate size. Independent claims are also included for the following: (i) a substrate treatment process in which substrates (32) are raised from and lowered into a treatment fluid (10) at a speed which varies according to their size; and (ii) a substrate treatment process in which substrates are lowered into a treatment fluid to different depths depending on their size.
IPC 1-7
IPC 8 full level
H01L 21/677 (2006.01); B05D 1/18 (2006.01); H01L 21/00 (2006.01); H01L 21/304 (2006.01); H01L 21/306 (2006.01)
CPC (source: EP KR)
B05D 1/18 (2013.01 - EP); H01L 21/02052 (2013.01 - EP); H01L 21/67023 (2013.01 - EP); H01L 21/68 (2013.01 - KR)
Citation (search report)
See references of WO 9938198A1
Designated contracting state (EPC)
AT BE DE FR GB NL
DOCDB simple family (publication)
DE 19802579 A1 19990729; EP 1050069 A1 20001108; JP 2002502111 A 20020122; KR 20010024876 A 20010326; TW 447032 B 20010721; WO 9938198 A1 19990729
DOCDB simple family (application)
DE 19802579 A 19980123; EP 9808469 W 19981228; EP 98966678 A 19981228; JP 2000528999 A 19981228; KR 20007008012 A 20000721; TW 88100877 A 19990121