Global Patent Index - EP 1061150 A2

EP 1061150 A2 2000-12-20 - Coating containing NiAl beta Phases

Title (en)

Coating containing NiAl beta Phases

Title (de)

NiAl-B-Phase enthaltende Beschichtung

Title (fr)

Revêtement comprenant des phases NiAl-beta

Publication

EP 1061150 A2 (DE)

Application

EP 00810410 A

Priority

DE 19926669 A

Abstract (en)

Layer contains Ni-Al- beta in the region of 20-90 vol.% with the following micro-alloying elements (in wt.%): 0.1-8 Fe and/or 0.1-8 Mo and/or 0.1-8 Ga. The total amount of Fe, Mo and Ga is maximum 10%.

Abstract (de)

Die Erfindung betrifft eine grosse Volumenanteile, vorzugsweise 20 bis 90 Vol.%, an NiAl--Phase in einer -Matrix enthaltende Beschichtung. Sie ist durch folgende, die Duktilität der Beschichtung erhöhende Mikrolegierungselemente (Angaben in Gew.-%) gekennzeichnet: 0.1-8 Fe und/oder 0,1-8 Mo und/oder 0,1-8 Ga, wobei der Gesamtanteil Fe, Mo und Ga maximal 10 % beträgt. Zusätzlich können geringe Anteile an Zr, C, und/oder B zulegiert sein, was die /-Phasengrenzen festigt.

IPC 1-7 (main, further and additional classification)

C22C 19/05; C23C 30/00

IPC 8 full level (invention and additional information)

C22C 19/05 (2006.01); C23C 28/00 (2006.01); C23C 30/00 (2006.01)

CPC (invention and additional information)

C23C 30/00 (2013.01)

Designated contracting state (EPC)

DE FR GB

EPO simple patent family

DE 19926669 A1 20001214; CN 1250771 C 20060412; CN 1280210 A 20010117; DE 50011352 D1 20060302; DE 50015301 D1 20080918; EP 1061150 A2 20001220; EP 1061150 A3 20001227; EP 1061150 B1 20051019; EP 1589122 A1 20051026; EP 1589122 B1 20080806; US 6471791 B1 20021029

INPADOC legal status


2016-12-16 [REG FR CD] CHANGE OF NAME OR COMPANY NAME

- Owner name: ALSTOM TECHNOLOGY LTD, CH

- Effective date: 20161110

2016-08-31 [PGFP FR] POSTGRANT: ANNUAL FEES PAID TO NATIONAL OFFICE

- Ref Country Code: FR

- Payment date: 20160520

- Year of fee payment: 17

2016-08-09 [REG DE R081] CHANGE OF APPLICANT/PATENTEE

- Owner name: GENERAL ELECTRIC TECHNOLOGY GMBH, CH

- Free text: FORMER OWNER: ALSTOM TECHNOLOGY LTD., BADEN, CH

- Document: DE 50011352

2016-08-09 [REG DE R082] CHANGE OF REPRESENTATIVE

- Document: DE 50011352

- Representative's name: ROESLER, UWE, DIPL.-PHYS.UNIV., DE

2016-07-29 [PGFP GB] POSTGRANT: ANNUAL FEES PAID TO NATIONAL OFFICE

- Ref Country Code: GB

- Payment date: 20160520

- Year of fee payment: 17

2016-07-29 [PGFP DE] POSTGRANT: ANNUAL FEES PAID TO NATIONAL OFFICE

- Ref Country Code: DE

- Payment date: 20160520

- Year of fee payment: 17

2016-05-20 [REG FR PLFP] FEE PAYMENT

- Ref Country Code: FR

- Year of fee payment: 17

2006-09-27 [26N] NO OPPOSITION FILED

- Effective date: 20060720

2006-05-26 [ET] FR: TRANSLATION FILED

2006-03-02 [REF] CORRESPONDS TO:

- Document: DE 50011352 P 20060302

2006-01-04 [GBT] GB: TRANSLATION OF EP PATENT FILED (GB SECTION 77(6)(A)/1977)

- Effective date: 20051212

2005-10-19 [AK] DESIGNATED CONTRACTING STATES:

- Kind Code of Ref Document: B1

- Designated State(s): DE FR GB

2005-10-19 [REG GB FG4D] EUROPEAN PATENT GRANTED

- Free text: NOT ENGLISH

2004-03-31 [RAP1] TRANSFER OF RIGHTS OF AN EP PUBLISHED APPLICATION

- Owner name: ALSTOM TECHNOLOGY LTD

2002-04-17 [RAP1] TRANSFER OF RIGHTS OF AN EP PUBLISHED APPLICATION

- Owner name: ALSTOM (SWITZERLAND) LTD

2001-10-17 [17Q] FIRST EXAMINATION REPORT

- Effective date: 20010831

2001-09-12 [AKX] PAYMENT OF DESIGNATION FEES

- Free text: DE FR GB

2001-07-04 [RAP1] TRANSFER OF RIGHTS OF AN EP PUBLISHED APPLICATION

- Owner name: ALSTOM (SCHWEIZ) AG

2001-06-27 [17P] REQUEST FOR EXAMINATION FILED

- Effective date: 20010421

2000-12-27 [AK] DESIGNATED CONTRACTING STATES:

- Kind Code of Ref Document: A3

- Designated State(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

2000-12-27 [AX] REQUEST FOR EXTENSION OF THE EUROPEAN PATENT TO

- Free text: AL;LT;LV;MK;RO;SI

2000-12-20 [AK] DESIGNATED CONTRACTING STATES:

- Kind Code of Ref Document: A2

- Designated State(s): DE FR GB

2000-12-20 [AX] REQUEST FOR EXTENSION OF THE EUROPEAN PATENT TO

- Free text: AL;LT;LV;MK;RO;SI