Global Patent Index - EP 1064260 A1

EP 1064260 A1 2001-01-03 - POLYMERISATION USING A COMPOUND WHICH IS BOTH AN INITIATOR AND A SURFACTANT

Title (en)

POLYMERISATION USING A COMPOUND WHICH IS BOTH AN INITIATOR AND A SURFACTANT

Title (de)

EMULSIONSPOLYMERISATION MIT EINER VERBINDUNG, DIE GLEICHZEITIG EIN TENSID UND INITIATOR IST

Title (fr)

POLYMERISATION EN EMULSION UTILISANT UN COMPOSE A LA FOIS SURFACTANT ET AMORCEUR

Publication

EP 1064260 A1 (FR)

Application

EP 00900551 A

Priority

  • FR 0000040 W
  • FR 9900394 A

Abstract (en)

[origin: WO0042006A1] The invention concerns novel compounds of formula (I) capable of being used both as surfactants and as radical polymerisation initiators. Said compounds are characterised in that they comprise a hydrophilic group and a hydrophobic group separated by a group containing a carbon-sulphur bond capable of being split by homolysis into two radicals for initiating a radical polymerisation. Said compounds are useful for the synthesis of block and grafted copolymers in emulsion.

IPC 1-7 (main, further and additional classification)

C07C 333/20; C08F 2/30; C08F 2/48; C08F 265/06

IPC 8 full level (invention and additional information)

C07C 333/20 (2006.01); C08F 2/24 (2006.01); C08F 2/26 (2006.01); C08F 2/30 (2006.01); C08F 2/48 (2006.01); C08F 2/50 (2006.01)

CPC (invention and additional information)

C07C 333/20 (2013.01); C08F 2/24 (2013.01); C08F 2/50 (2013.01)

Citation (search report)

See references of WO 0042006A1

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

EPO simple patent family

WO 0042006 A1 20000720; AU 3052300 A 20000801; EP 1064260 A1 20010103; JP 2002534499 A 20021015

INPADOC legal status


2003-01-08 [18D] DEEMED TO BE WITHDRAWN

- Effective date: 20020629

2002-04-03 [17Q] FIRST EXAMINATION REPORT

- Effective date: 20020218

2001-04-18 [17P] REQUEST FOR EXAMINATION FILED

- Effective date: 20000908

2001-01-03 [AK] DESIGNATED CONTRACTING STATES:

- Kind Code of Ref Document: A1

- Designated State(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE