EP 1068019 A1 20010117 - ENERGY EMISSION SYSTEM FOR PHOTOLITHOGRAPHY
Title (en)
ENERGY EMISSION SYSTEM FOR PHOTOLITHOGRAPHY
Title (de)
ENERGIE-EMISSIONSSYSTEM FÜR PHOTOLITHOGRAPHIE
Title (fr)
SYSTEME D'EMISSION D'ENERGIE POUR PHOTOLITHOGRAPHIE
Publication
Application
Priority
- US 9907429 W 19990402
- US 5497798 A 19980403
- US 5502498 A 19980403
Abstract (en)
[origin: WO9951357A1] An emitted energy system is provided. The emitted energy system (10) may include a fluid (34) communicated through a nozzle (22). The fluid (34) communicated through the nozzle (22) may form a fluid plume (40). An input energy (64) may be applied to the fluid (34) in the fluid plume (40). The input energy (64) may excite the fluid (34) in the fluid plume (40) into producing an emitted energy (16). The emitted energy (16) is collected and directed by an output optics (18) to a target (20). In one embodiment, the target (20) is a photolithography system interface (68) for fabricating a semiconductor device (70). A remotely-controlled XYZ micro-positioning stage (620) facilitates alignment of the nozzle (510) and the diffuser (512) to the radiated energy beam.
IPC 1-7
IPC 8 full level
B05B 1/34 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01); H05G 1/00 (2006.01); H05G 2/00 (2006.01)
CPC (source: EP)
B82Y 10/00 (2013.01); G03F 7/70033 (2013.01); G03F 7/70858 (2013.01); H05G 2/003 (2013.01); H05G 2/008 (2013.01)
Citation (search report)
See references of WO 9951357A1
Designated contracting state (EPC)
DE FR IT NL
DOCDB simple family (publication)
WO 9951357 A1 19991014; AU 3381799 A 19991025; EP 1068019 A1 20010117; JP 2002510548 A 20020409
DOCDB simple family (application)
US 9907429 W 19990402; AU 3381799 A 19990402; EP 99915262 A 19990402; JP 2000542116 A 19990402