EP 1074043 A1 20010207 - PROCESS FOR ASHING ORGANIC MATERIALS FROM SUBSTRATES
Title (en)
PROCESS FOR ASHING ORGANIC MATERIALS FROM SUBSTRATES
Title (de)
VERFAHREN ZUR VERASCHUNG VON ORGANISCHEN MATERIALEN AUF SUBSTRATEN
Title (fr)
PROCEDE DE BRULAGE DE MATERIAUX ORGANIQUES PRESENTS A LA SURFACE DE SUBSTRATS
Publication
Application
Priority
- US 9901560 W 19990126
- US 1469598 A 19980128
Abstract (en)
[origin: WO9939382A1] Ashing of an organic film from a substrate is carried out by providing a plasma comprising a gas or gas mixture selected from the following groups: (a) sulfur trioxide alone; (2) sulfur trioxide plus one supplemental gas; and (3) sulfur trioxide plus at least two supplemental gases. Any of the following gases may be employed as the supplemental gas: water vapor, ozone, hydrogen, nitrogen, nitrogen oxides, or a halogenide such as tetrafluoromethane, chlorine, nitrogen trifluoride, hexafluoroethane, or methyltrifluoride.
IPC 1-7
IPC 8 full level
G03F 7/42 (2006.01); H01L 21/302 (2006.01); H01L 21/3065 (2006.01); H01L 21/311 (2006.01); H05K 3/26 (2006.01)
CPC (source: EP KR)
G03F 7/427 (2013.01 - EP); H01L 21/302 (2013.01 - KR); H01L 21/31138 (2013.01 - EP); H05K 3/26 (2013.01 - EP)
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
DOCDB simple family (publication)
WO 9939382 A1 19990805; CA 2319018 A1 19990805; CA 2319018 C 20040824; CN 1154159 C 20040616; CN 1289452 A 20010328; EP 1074043 A1 20010207; EP 1074043 A4 20021106; IL 137513 A0 20010724; IL 137513 A 20040512; JP 2002502125 A 20020122; JP 3358808 B2 20021224; KR 100377711 B1 20030326; KR 20010040431 A 20010515; MY 134851 A 20071231; TW I239994 B 20050921
DOCDB simple family (application)
US 9901560 W 19990126; CA 2319018 A 19990126; CN 99802399 A 19990126; EP 99904261 A 19990126; IL 13751399 A 19990126; JP 2000529750 A 19990126; KR 20007008217 A 20000727; MY PI9900277 A 19990126; TW 88101212 A 19990323