EP 1086260 A1 20010328 - OXYGEN-ARGON GAS MIXTURE FOR PRECLEANING IN VACUUM PROCESSING SYSTEM
Title (en)
OXYGEN-ARGON GAS MIXTURE FOR PRECLEANING IN VACUUM PROCESSING SYSTEM
Title (de)
SAUERSTOFF-ARGON GASGEMISCH ZUR VORREINIGUNG EINES VAKUUMPROZESSSYSTEMS
Title (fr)
MELANGE DE GAZ ARGON-OXYGENE PERMETTANT UN PRE-NETTOYAGE DANS UN SYSTEME DE TRAITEMENT SOUS VIDE
Publication
Application
Priority
- US 9910392 W 19990511
- US 7658998 A 19980512
Abstract (en)
[origin: WO9958739A1] A method for cleaning, or pre-cleaning, a process objet, such as a substrate, uses a process gas, such as argon, mixed with a quantity of oxygen. The process gas sputter etches material from the surface of the process object to clean or remove oxides, or other contaminants, therefrom. The oxygen reacts with the etched material to form stoichiometrically balanced compounds that deposit in a smooth film on a process kit. The process kit is periodically removed and replaced after a predetermined number of process objects have been processed, or cleaned.
IPC 1-7
C23C 16/44; C23C 16/02; C23C 14/02; H01J 37/32; H01L 21/00; B08B 7/00
IPC 8 full level
B08B 7/00 (2006.01); C23C 14/02 (2006.01); C23C 16/02 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01); H01L 21/302 (2006.01); H01L 21/3065 (2006.01); H01L 21/3213 (2006.01)
CPC (source: EP KR)
C23C 14/022 (2013.01 - EP); C23C 16/0245 (2013.01 - EP); C23C 16/44 (2013.01 - KR); H01J 2237/335 (2013.01 - EP); H01L 21/32136 (2013.01 - EP)
Citation (search report)
See references of WO 9958739A1
Designated contracting state (EPC)
BE DE GB NL
DOCDB simple family (publication)
WO 9958739 A1 19991118; EP 1086260 A1 20010328; JP 2002514831 A 20020521; KR 20010043555 A 20010525
DOCDB simple family (application)
US 9910392 W 19990511; EP 99921909 A 19990511; JP 2000548527 A 19990511; KR 20007012675 A 20001113