EP 1087848 A1 20010404 - METHODS OF WET PROCESSING ELECTRONIC COMPONENTS USING PROCESS LIQUIDS WITH CONTROLLED LEVELS OF GASES
Title (en)
METHODS OF WET PROCESSING ELECTRONIC COMPONENTS USING PROCESS LIQUIDS WITH CONTROLLED LEVELS OF GASES
Title (de)
VERFAHREN ZUR NASSBEHANDLUNG ELEKTRONISCHER KOMPONENTEN UNTER BENUTZUNG VON PROZESSFLÜSSIGKEITEN MIT KONTROLLIERTEM GASGEHALT
Title (fr)
PROCEDE DE TRAITEMENT HUMIDE DE COMPOSANTS ELECTRONIQUES UTILISANT DES LIQUIDES DE TRAITEMENT A TENEURS EN GAZ CONTROLEES
Publication
Application
Priority
- US 9903880 W 19990223
- US 7617598 P 19980227
- US 25315799 A 19990219
Abstract (en)
[origin: WO9943448A1] The present invention is related to wet processing methods for electronic components using process liquids having controlled levels (i.e., amounts) of gases. The present invention provides methods of wet processing where at least two process liquids used during a wet processing procedure contain different levels of gases. Sonic energy may optionally be used in one or more wet process steps of a wet processing procedure to enhance results. The methods of the present invention can result in, for example, improved cleaning or reduced particle contamination during a wet processing procedure.
IPC 1-7
IPC 8 full level
B08B 3/04 (2006.01); B08B 3/08 (2006.01); B08B 3/12 (2006.01); H01L 21/304 (2006.01); H01L 21/306 (2006.01); H01L 21/308 (2006.01)
CPC (source: EP KR)
B08B 3/04 (2013.01 - EP); B08B 3/12 (2013.01 - EP); H01L 21/02052 (2013.01 - EP); H01L 21/304 (2013.01 - KR)
Citation (search report)
See references of WO 9943448A1
Designated contracting state (EPC)
DE FR GB IT
DOCDB simple family (publication)
WO 9943448 A1 19990902; WO 9943448 A8 20010208; AU 2781799 A 19990915; CN 1291921 A 20010418; EP 1087848 A1 20010404; JP 2002535829 A 20021022; KR 20010041359 A 20010515
DOCDB simple family (application)
US 9903880 W 19990223; AU 2781799 A 19990223; CN 99803308 A 19990223; EP 99908366 A 19990223; JP 2000533236 A 19990223; KR 20007009475 A 20000825