EP 1092173 A1 20010418 - SILVER BASED PHOTOMASKS
Title (en)
SILVER BASED PHOTOMASKS
Title (de)
AUF SILBER BASIERENDE PHOTOMASKEN
Title (fr)
PHOTOMASQUES A BASE D'ARGENT
Publication
Application
Priority
- GB 9901484 W 19990528
- GB 9811563 A 19980530
Abstract (en)
[origin: WO9963406A1] In the field of semiconductor photomask manufacture there is a need to produce photomasks more rapidly and with fewer flaws. There is also a need for photomasks capable of producing much finer resolution circuits than hitherto. There is disclosed a method of manufacturing a photomask (10) in which a substrate (11) is coated with an emulsion of gelatin (18) and a photosensitive silver halide (17). On exposure to an electron beam (15) or a laser beam, controlled to generate a desired pattern of movement, the silver halide reduces to create a photomask (10) after development and fixing.
IPC 1-7
IPC 8 full level
G03F 1/08 (2006.01); G03F 1/12 (2006.01); G03F 1/54 (2012.01); H01L 21/027 (2006.01)
CPC (source: EP)
G03F 1/54 (2013.01)
Citation (search report)
See references of WO 9963406A1
Designated contracting state (EPC)
DE FR GB IT NL SE
DOCDB simple family (publication)
WO 9963406 A1 19991209; AU 4050199 A 19991220; EP 1092173 A1 20010418; GB 9811563 D0 19980729; JP 2002517785 A 20020618
DOCDB simple family (application)
GB 9901484 W 19990528; AU 4050199 A 19990528; EP 99923736 A 19990528; GB 9811563 A 19980530; JP 2000552555 A 19990528