Global Patent Index - EP 1094990 A1

EP 1094990 A1 20010502 - METHODS FOR MAKING ULTRA-LOW EXPANSION SILICA-TITANIA GLASSES

Title (en)

METHODS FOR MAKING ULTRA-LOW EXPANSION SILICA-TITANIA GLASSES

Title (de)

VERFAHREN ZUR HERSTELLUNG VON KIESELSÄURE-TITANDIOXID-GLÄSERN MIT ULTRANIEDRIGER AUSDEHNUNG

Title (fr)

PROCEDES DE FABRICATION DE VERRES EN SILICE-ANHYDRIDE TITANIQUE A EXPANSION ULTRA FAIBLE

Publication

EP 1094990 A1 20010502 (EN)

Application

EP 99919954 A 19990421

Priority

  • US 9908777 W 19990421
  • US 8271098 P 19980422

Abstract (en)

[origin: WO9954259A1] Ultra-low expansion silica-titania glasses are produced by flame deposition of a mixture of vaporized octamethylcyclotetrasiloxane (OMCTS) and vaporized titanium isopropoxide (Ti-Ipox). Ti-Ipox is vaporized by nitrogen bubbled from conduit (16) into tank (12) and OMCTS is vaporized by nitrogen bubbled from conduit (14) in tank (10). Before being mixed with the Ti-Ipox, the OMCTS is dried so that its water content is less than 2 ppm and preferably less than 1 ppm. In this way, the formation of a precipitate on the glass making equipment (e.g., burners (28), distribution manifold (26), static mixer (18), joint (13), and conduits (20, 22, 24 and 30)) is avoided. Such a precipitate if allowed to form will result in premature shutdown of the glass making process and can result in undesirable variations in the composition of the silica-titania glass being produced.

IPC 1-7

C03B 8/04; C03B 20/00

IPC 8 full level

C03B 8/04 (2006.01); C03B 19/14 (2006.01); C03C 3/06 (2006.01)

CPC (source: EP)

C03B 19/1415 (2013.01); C03C 3/06 (2013.01); C03B 2201/02 (2013.01); C03B 2201/42 (2013.01); C03B 2207/32 (2013.01); C03B 2207/34 (2013.01); C03B 2207/85 (2013.01); C03C 2201/42 (2013.01); C03C 2203/40 (2013.01)

Citation (search report)

See references of WO 9954259A1

Designated contracting state (EPC)

DE FR GB

DOCDB simple family (publication)

WO 9954259 A1 19991028; EP 1094990 A1 20010502; JP 2002512169 A 20020423

DOCDB simple family (application)

US 9908777 W 19990421; EP 99919954 A 19990421; JP 2000544606 A 19990421