EP 1097261 A2 20010509 - GALVANIC BATH, METHOD FOR PRODUCING STRUCTURED HARD CHROMIUM LAYERS AND USE THEREOF
Title (en)
GALVANIC BATH, METHOD FOR PRODUCING STRUCTURED HARD CHROMIUM LAYERS AND USE THEREOF
Title (de)
GALVANISCHES BAD UND VERFAHREN ZUR ERZEUGUNG STRUKTURIERTER HARTCHROMSCHICHTEN UND VERWENDUNG
Title (fr)
BAIN GALVANIQUE, PROCEDE PERMETTANT DE PRODUIRE DES COUCHES STRUCTUREES DE CHROME DUR ET UTILISATION DUDIT PROCEDE
Publication
Application
Priority
- DE 19828545 A 19980626
- EP 9904412 W 19990624
Abstract (en)
[origin: US6447666B1] The present invention relates to a galvanic bath, to a process for the precipitation of chromium onto objects, and to the use of the process for the generation of textured hard-chrome layers on machine components. The galvanic bath contains in aqueous solution at least one compound delivering chromium(VI)-ions, and it comprises a) chromium(VI)-ions in an amount that corresponds to 100 to 600 g/ltr of chromic acid anhydride, b) sulfate ions in the form of sulfuric acid and/or of a soluble salt thereof in a molar concentration ratio of chromium(VI)-ions to sulfate ions (SO4-2) ranging from 90:1 to 120:1, and c) 2-hydroxyethane sulfonate ions in an amount that corresponds to 0.01 to 3.0 g/ltr of the sodium salt.
IPC 1-7
IPC 8 full level
C25D 3/04 (2006.01); B41N 7/04 (2006.01); C25D 1/00 (2006.01); C25D 3/10 (2006.01); C25D 5/14 (2006.01); C25D 5/16 (2006.01); C25D 5/18 (2006.01); C25D 7/00 (2006.01); C25D 7/10 (2006.01)
CPC (source: EP KR US)
B41N 7/04 (2013.01 - EP US); C25D 3/04 (2013.01 - KR); C25D 3/10 (2013.01 - EP US); B41N 2207/02 (2013.01 - EP US); B41N 2207/10 (2013.01 - EP US)
Citation (search report)
See references of WO 0000672A2
Designated contracting state (EPC)
AT CH DE FR GB IT LI NL SE
DOCDB simple family (publication)
US 6447666 B1 20020910; AT E231933 T1 20030215; BR 9912214 A 20010410; CA 2334708 A1 20000106; CN 1191392 C 20050302; CN 1307652 A 20010808; CZ 20004789 A3 20011212; CZ 299000 B6 20080402; DE 19828545 C1 19990812; DE 59904174 D1 20030306; EP 1097261 A2 20010509; EP 1097261 B1 20030129; JP 2002519514 A 20020702; KR 100573531 B1 20060426; KR 20010072627 A 20010731; RU 2202005 C2 20030410; WO 0000672 A2 20000106; WO 0000672 A3 20000629
DOCDB simple family (application)
US 70153001 A 20010307; AT 99931178 T 19990624; BR 9912214 A 19990624; CA 2334708 A 19990624; CN 99807932 A 19990624; CZ 20004789 A 19990624; DE 19828545 A 19980626; DE 59904174 T 19990624; EP 9904412 W 19990624; EP 99931178 A 19990624; JP 2000557019 A 19990624; KR 20007014501 A 20001220; RU 2001102496 A 19990624