EP 1105703 A1 20010613 - METHOD AND APPARATUS FOR MONITORING PLASMA PROCESSING OPERATIONS
Title (en)
METHOD AND APPARATUS FOR MONITORING PLASMA PROCESSING OPERATIONS
Title (de)
Verfahren und Vorrichtung zur Überwachtung von Plasma-Bearbeitungsvorgängen
Title (fr)
PROCEDE ET DISPOSITIF DE SURVEILLANCE DES OPERATIONS DE TRAITEMENT AU PLASMA
Publication
Application
Priority
- US 9908894 W 19990423
- US 6520398 A 19980423
- US 6496698 A 19980423
- US 6524598 A 19980423
- US 6500698 A 19980423
- US 6535998 A 19980423
- US 6479398 A 19980423
- US 6495798 A 19980423
- US 6568098 A 19980423
- US 6499198 A 19980423
- US 6525798 A 19980423
- US 6530798 A 19980423
- US 6527498 A 19980423
- US 6497098 A 19980423
- US 6524798 A 19980423
- US 6496598 A 19980423
- US 6519598 A 19980423
- US 6536298 A 19980423
- US 6497298 A 19980423
- US 6535898 A 19980423
- US 29090399 A 19990412
Abstract (en)
[origin: WO9954694A1] The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in some manner to calibrating or initializing a plasma monitoring assembly (174). This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window (124) through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber (74).
IPC 1-7
IPC 8 full level
G01J 3/00 (2006.01); G01J 3/02 (2006.01); G01J 3/28 (2006.01); G01J 3/44 (2006.01); G01J 3/443 (2006.01); G01N 21/71 (2006.01); H01J 37/32 (2006.01); H01L 21/302 (2006.01); H01L 21/3065 (2006.01); H05H 1/00 (2006.01)
CPC (source: EP KR)
G01J 3/00 (2013.01 - KR); G01J 3/28 (2013.01 - EP); G01J 3/443 (2013.01 - EP); G01J 2003/2866 (2013.01 - EP)
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
DOCDB simple family (publication)
WO 9954694 A1 19991028; WO 9954694 A9 20010809; EP 1105703 A1 20010613; EP 1105703 A4 20050803; JP 2003524753 A 20030819; KR 20010042965 A 20010525; KR 20040053203 A 20040623
DOCDB simple family (application)
US 9908894 W 19990423; EP 99918803 A 19990423; JP 2000544994 A 19990423; KR 20007011793 A 20001023; KR 20047006151 A 19990423