Global Patent Index - EP 1111036 A3

EP 1111036 A3 20030702 - Cleaning composition and use thereof

Title (en)

Cleaning composition and use thereof

Title (de)

Reinigungsmedium und dessen Verwendung

Title (fr)

Composition détergente et son utilisation

Publication

EP 1111036 A3 20030702 (DE)

Application

EP 00127878 A 20001220

Priority

DE 19963124 A 19991224

Abstract (en)

[origin: EP1111036A2] A cleaning medium (I) comprises: (a) an agent producing a pH of 1-4 and an agent producing a pH of 10-14 in solution; (b) a dispersable abrasive substance at 1-15 g; (c) a foam-lacking tensid at 0.1-50g; (d) a solvent at 10-50g; (e) water to make 100 g; and optionally (f) other additives. Independent claims are also included for: (1) a concentrate of (I), comprising (a)-(d), but very little water and optionally (f); and (2) a container with a dosing device.

IPC 1-7

C11D 17/00; C11D 3/43; B41N 3/00; B41N 3/06; C11D 3/02; C11D 3/14; C11D 1/83

IPC 8 full level

B41F 35/00 (2006.01); B41N 3/00 (2006.01); B41N 3/06 (2006.01); C11D 1/68 (2006.01); C11D 1/72 (2006.01); C11D 3/02 (2006.01); C11D 3/06 (2006.01); C11D 3/12 (2006.01); C11D 3/14 (2006.01); C11D 3/18 (2006.01); C11D 3/20 (2006.01); C11D 3/30 (2006.01); C11D 3/33 (2006.01); C11D 17/08 (2006.01)

CPC (source: EP US)

B41N 3/006 (2013.01 - EP US); C11D 3/042 (2013.01 - EP US); C11D 3/044 (2013.01 - EP US); C11D 3/1213 (2013.01 - EP US); C11D 3/14 (2013.01 - EP US); C11D 3/18 (2013.01 - EP US); C11D 17/0013 (2013.01 - EP US)

Citation (search report)

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

DOCDB simple family (publication)

EP 1111036 A2 20010627; EP 1111036 A3 20030702; EP 1111036 B1 20070314; CA 2329535 A1 20010624; CA 2329535 C 20070529; DE 19963124 A1 20010712; DE 50014158 D1 20070426; JP 2001234199 A 20010828; JP 3527198 B2 20040517; US 2001008877 A1 20010719; US 6525008 B2 20030225

DOCDB simple family (application)

EP 00127878 A 20001220; CA 2329535 A 20001222; DE 19963124 A 19991224; DE 50014158 T 20001220; JP 2000385743 A 20001219; US 74613400 A 20001221