Global Patent Index - EP 1112289 B1

EP 1112289 B1 20060104 - LOW TEMPERATURE ELECTRON BEAM POLYMERIZATION

Title (en)

LOW TEMPERATURE ELECTRON BEAM POLYMERIZATION

Title (de)

ELEKTRONENSTRAHLUNGSPOLYMERISATION NIEDRIGER TEMPERATUR

Title (fr)

POLYMERISATION PAR FAISCEAU ELECTRONIQUE A BASSE TEMPERATURE

Publication

EP 1112289 B1 20060104 (EN)

Application

EP 99928593 A 19990611

Priority

  • US 9913262 W 19990611
  • US 11839298 A 19980717

Abstract (en)

[origin: WO0004055A1] A method for polymerizing a free-radical initiated adhesive syrup of an C8-13 alkyl acrylate monomer, optionally including one or more comonomers, by irradiating the adhesive syrup with about 20 to 100 kGy of accelerated electrons over a residence time of greater than 1 second at a temperature below 20 DEG C. The method produces a pressure-sensitive adhesive with balanced peel adhesion, shear strength and conversion.

IPC 8 full level

C08F 2/54 (2006.01); C08F 2/46 (2006.01); C08F 20/18 (2006.01); C09J 4/00 (2006.01); C09J 4/06 (2006.01); C09J 133/06 (2006.01)

CPC (source: EP US)

C08F 20/18 (2013.01 - EP US); C09J 4/00 (2013.01 - EP US)

C-Set (source: EP US)

C09J 4/00 + C08F 220/1808

Designated contracting state (EPC)

DE FR GB IT

DOCDB simple family (publication)

WO 0004055 A1 20000127; DE 69929335 D1 20060330; DE 69929335 T2 20060727; EP 1112289 A1 20010704; EP 1112289 B1 20060104; JP 2002520450 A 20020709; JP 4229593 B2 20090225; US 6232365 B1 20010515

DOCDB simple family (application)

US 9913262 W 19990611; DE 69929335 T 19990611; EP 99928593 A 19990611; JP 2000560160 A 19990611; US 11839298 A 19980717