EP 1122766 A2 20010808 - Method and apparatus for enhanced chamber cleaning
Title (en)
Method and apparatus for enhanced chamber cleaning
Title (de)
Verfahren und Vorrichtung zur verbesserten Kammerreinigung
Title (fr)
Méthode et appareil pour améliorer le nettoyage de chambres
Publication
Application
Priority
US 49458100 A 20000131
Abstract (en)
A system for processing substrates within a chamber and for cleaning accumulated material from chamber components is provided. The system includes a reactive species generator adapted to generate a reactive gas species for chemically etching accumulated material from chamber components, and a processing chamber (11) having at least one component with a mirror polished surface which is exposed to the reactive species. Preferably to have the greatest impact on chamber cleaning efficiency, the mirror polished surface is a surface of a component such as a gas distribution plate (12) or a backing plate (13), and/or is a surface of a plurality of smaller components (e.g., chamber wall liners, a gas conductance line, etc.) so as to constitute a large percentage of the surface area exposed to the reactive species contacts are mirror polished.
IPC 1-7
IPC 8 full level
B08B 7/00 (2006.01); B08B 9/08 (2006.01); C23C 16/44 (2006.01); H01L 21/00 (2006.01); H01L 21/205 (2006.01); H01L 21/302 (2006.01); H01L 21/304 (2006.01); H01L 21/3065 (2006.01)
CPC (source: EP KR US)
H01L 21/304 (2013.01 - KR); H01L 21/67063 (2013.01 - EP US); H01L 21/67069 (2013.01 - EP US)
Designated contracting state (EPC)
CH DE LI
DOCDB simple family (publication)
EP 1122766 A2 20010808; EP 1122766 A3 20060531; EP 1122766 B1 20080730; DE 60135049 D1 20080911; JP 2001308019 A 20011102; JP 2010242224 A 20101028; JP 2013175730 A 20130905; JP 5686999 B2 20150318; KR 100553481 B1 20060222; KR 20010078211 A 20010820; SG 94748 A1 20030318; TW 473803 B 20020121; US 2002174885 A1 20021128; US 6432255 B1 20020813; US 6863077 B2 20050308
DOCDB simple family (application)
EP 01300835 A 20010131; DE 60135049 T 20010131; JP 2001024120 A 20010131; JP 2010161660 A 20100716; JP 2013041131 A 20130301; KR 20010004593 A 20010131; SG 200100459 A 20010130; TW 90101966 A 20010131; US 19571802 A 20020715; US 49458100 A 20000131