EP 1126321 A1 20010822 - Positive photoresists containing crosslinked polymers
Title (en)
Positive photoresists containing crosslinked polymers
Title (de)
Positiv-Fotoresists die vernetzte Polymere enthalten
Title (fr)
Photoréserve de type positif contenant des polymères réticulés
Publication
Application
Priority
US 18158500 P 20000210
Abstract (en)
The invention provides novel cross-linked polymers and positive chemically-amplified photoresist compositions that comprise a photoactive component and such cross-linked polymers. Resists of the invention can exhibit enhanced lithographic results relative to comparable compositions where the polymers are not crosslinked.
IPC 1-7
IPC 8 full level
C08F 212/14 (2006.01); C08K 5/00 (2006.01); C08L 101/02 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
C08F 212/24 (2020.02 - EP US); G03F 7/0045 (2013.01 - EP US); G03F 7/039 (2013.01 - EP KR US); G03F 7/0392 (2013.01 - EP US)
Citation (search report)
- [PX] US 6136504 A 20001024 - TAN SHIRO [JP], et al & JP H11344808 A 19991214 - FUJI PHOTO FILM CO LTD
- [X] EP 0930541 A1 19990721 - JSR CORP [JP]
- [PX] US 6033828 A 20000307 - SHIMADA JUNJI [JP], et al & JP H10268508 A 19981009 - SHINETSU CHEMICAL CO
- [PX] US 6156481 A 20001205 - TAKEDA TAKANOBU [JP], et al
- [E] EP 1077391 A1 20010221 - SHINETSU CHEMICAL CO [JP]
Designated contracting state (EPC)
DE FR GB IT NL
DOCDB simple family (publication)
EP 1126321 A1 20010822; JP 2002020639 A 20020123; KR 20010088327 A 20010926; US 2002012869 A1 20020131
DOCDB simple family (application)
EP 01301054 A 20010206; JP 2001035110 A 20010213; KR 20010006571 A 20010210; US 78098901 A 20010209