EP 1126322 A2 20010822 - Resist compositions comprising fluorine-containing polymers, and patterning process
Title (en)
Resist compositions comprising fluorine-containing polymers, and patterning process
Title (de)
Resistzusammensetzungen mit fluorhaltigen Polymeren, und Musterbildungsverfahren
Title (fr)
Compositions pour réserves comprenant polymères contenant du fluor, et procédé d'obtention de motifs
Publication
Application
Priority
JP 2000038309 A 20000216
Abstract (en)
Polymers having fluorinated ester groups are novel. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.
IPC 1-7
G03F 7/039; C08F 20/22; C08F 20/24; C08F 32/00; C08F 32/08; C08F 22/40; C08F 22/18; G03F 7/004
IPC 8 full level
C08F 20/22 (2006.01); C08F 20/24 (2006.01); C08F 22/18 (2006.01); C08F 22/40 (2006.01); C08F 32/00 (2006.01); C08F 32/08 (2006.01); C08F 220/22 (2006.01); C08F 222/18 (2006.01); C08F 222/40 (2006.01); C08F 232/04 (2006.01); C08F 232/08 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01)
CPC (source: EP KR US)
C08F 20/22 (2013.01 - EP US); C08F 22/18 (2013.01 - EP US); C08F 22/40 (2013.01 - EP US); C08F 32/00 (2013.01 - EP US); G03F 7/00 (2013.01 - KR); G03F 7/0046 (2013.01 - EP US); G03F 7/039 (2013.01 - EP US); C08F 220/22 (2013.01 - EP US); C08F 232/04 (2013.01 - EP US); C08F 232/08 (2013.01 - EP US); G03F 7/0045 (2013.01 - EP US)
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
EP 1126322 A2 20010822; EP 1126322 A3 20010829; KR 20010088333 A 20010926; TW 553959 B 20030921; US 2001033989 A1 20011025
DOCDB simple family (application)
EP 01301347 A 20010216; KR 20010007454 A 20010215; TW 90103469 A 20010215; US 78346701 A 20010215