EP 1131845 A1 20010912 - EQUIPMENT FOR UV WAFER HEATING AND PHOTOCHEMICAL PROCESSING
Title (en)
EQUIPMENT FOR UV WAFER HEATING AND PHOTOCHEMICAL PROCESSING
Title (de)
VORRICHTUNG ZUM UV-ERHITZEN EINER HALBLEITERSCHEIBE UND ZUR PHOTOCHEMISCHEN BEHANDLUNG
Title (fr)
EQUIPEMENT DE CHAUFFE ET DE TRAITEMENT PHOTOCHIMIQUE DE TRANCHES A L'AIDE DU RAYONNEMENT ULTRAVIOLET
Publication
Application
Priority
US 9824491 W 19981116
Abstract (en)
[origin: WO0030157A1] The apparatus of the present invention provides for the dual use of a UV source to heat a substrate and to facilitate photochemistry necessary for the treatment of the substrate. The present invention also provides a method for processing a substrate by heating the substrate to a temperature above ambient via UV radiation at a first power level and conditioning the substrate by exposing the substrate to a photochemically (UV) reactive chemical, or a reactive chemical that can react with a compound on the surface of the substrate to form a photochemically reactive compound, in the presence of UV radiation at a second power level.
IPC 1-7
IPC 8 full level
H01L 21/00 (2006.01); H01L 21/302 (2006.01); H01L 21/306 (2006.01); H01L 21/3065 (2006.01)
CPC (source: EP KR)
H01L 21/02049 (2013.01 - EP); H01L 21/263 (2013.01 - KR); H01L 21/67115 (2013.01 - EP)
Citation (search report)
See references of WO 0030157A1
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
WO 0030157 A1 20000525; CN 1155990 C 20040630; CN 1337062 A 20020220; EP 1131845 A1 20010912; JP 2002530859 A 20020917; KR 20010107966 A 20011207
DOCDB simple family (application)
US 9824491 W 19981116; CN 98814315 A 19981116; EP 98960239 A 19981116; JP 2000583072 A 19981116; KR 20017006177 A 20010516