EP 1144710 A3 20011205 - ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND CONTROL PANEL THEREFOR
Title (en)
ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND CONTROL PANEL THEREFOR
Title (de)
ELEKTRONENSTRAHL-PVD VORRICHTUNG UND SEINE STEUERTAFEL
Title (fr)
DISPOSITIF DE DEPOT EN PHASE GAZEUSE PAR PROCEDE PHYSIQUE A FAISCEAU ELECTRONIQUE ET PANNEAU DE COMMANDE ASSOCIE
Publication
Application
Priority
- US 0021131 W 20000803
- US 14722999 P 19990804
- US 62175400 A 20000724
Abstract (en)
[origin: WO0111103A2] An electron beam physical vapor deposition apparatus (10) for producing a coating on an article (20). The apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gum (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. The operation of the EBPVD apparatus (10) is enhanced by a control panel (118) with which components of the apparatus (10) can be monitored and controlled. The control panel (118) includes a schematic of the apparatus (10) and its components, with indicia (120) of the components, visual indicators associated with the indicia (120) for indicating the operating status of the components, and controls (124) associated with the indicia (120) and adjacent the visual indicators for changing the operation of the corresponding component of the EBPVD apparatus (10).
IPC 1-7
IPC 8 full level
C23C 14/24 (2006.01); C23C 14/30 (2006.01); C23C 14/56 (2006.01); F01D 25/00 (2006.01); F02C 7/00 (2006.01); H01J 37/30 (2006.01); H01J 37/305 (2006.01); H01J 37/317 (2006.01)
CPC (source: EP)
C23C 14/30 (2013.01); C23C 14/566 (2013.01)
Citation (search report)
See references of WO 0111103A2
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
DOCDB simple family (publication)
WO 0111103 A2 20010215; WO 0111103 A3 20010816; EP 1144710 A2 20011017; EP 1144710 A3 20011205; JP 2003522291 A 20030722; UA 73725 C2 20050915
DOCDB simple family (application)
US 0021131 W 20000803; EP 00975181 A 20000803; JP 2001515347 A 20000803; UA 2001042219 A 20000803