EP 1144723 A3 20021113 - METHOD FOR COATING APPARATUSES AND PARTS OF APPARATUSES USED IN CHEMICAL MANUFACTURING
Title (en)
METHOD FOR COATING APPARATUSES AND PARTS OF APPARATUSES USED IN CHEMICAL MANUFACTURING
Title (de)
VERFAHREN ZUR BESCHICHTUNG VON APPARATEN UND APPARATETEILEN FÜR DEN CHEMISCHEN ANLAGENBAU
Title (fr)
PROCEDE POUR APPLIQUER UN REVETEMENT SUR DES APPAREILS OU DES PARTIES D'APPAREILS UTILISES POUR LA CONSTRUCTION D'INSTALLATIONS CHIMIQUES
Publication
Application
Priority
- DE 19860526 A 19981230
- EP 9910371 W 19991224
Abstract (en)
[origin: DE19860526A1] The invention relates to a method for coating a reactor. Said method is characterised in that a metal layer or a metal polymer dispersion layer is deposited on the inner surface of the reactor in a currentless manner by contacting the surfaces to a metal electrolytic solution which contains a reduction means and a halogenated polymer in dispersed form in addition to the metal electrolyte. Said halogenated polymer can optionally be deposited.
IPC 1-7
IPC 8 full level
C08F 2/01 (2006.01); C08F 10/00 (2006.01); C23C 18/16 (2006.01); C23C 18/31 (2006.01); C23C 18/34 (2006.01); C23C 18/36 (2006.01); C23C 18/40 (2006.01); C23C 18/48 (2006.01); C23C 18/50 (2006.01); C23C 18/52 (2006.01); F28F 19/02 (2006.01); F28F 19/06 (2006.01)
CPC (source: EP KR US)
C23C 18/1616 (2013.01 - EP US); C23C 18/1662 (2013.01 - EP KR US); C23C 18/32 (2013.01 - KR); C23C 18/36 (2013.01 - EP US); C23C 18/38 (2013.01 - KR); F28F 19/02 (2013.01 - EP US); F28F 19/06 (2013.01 - KR); F28F 2245/00 (2013.01 - KR); Y10T 428/12556 (2015.01 - EP US); Y10T 428/12944 (2015.01 - EP US); Y10T 428/31678 (2015.04 - EP US)
Citation (search report)
See references of WO 0040774A2
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
DOCDB simple family (publication)
DE 19860526 A1 20000706; AT E227360 T1 20021115; AT E237006 T1 20030415; AT E245210 T1 20030815; CA 2358097 A1 20000713; CA 2358099 A1 20000713; CN 1332810 A 20020123; CN 1338008 A 20020227; CN 1636305 A 20050706; DE 59903362 D1 20021212; DE 59905005 D1 20030515; DE 59906313 D1 20030821; EP 1144723 A2 20011017; EP 1144723 A3 20021113; EP 1144723 B1 20030409; EP 1144724 A2 20011017; EP 1144724 B1 20021106; EP 1144725 A2 20011017; EP 1144725 B1 20030716; ES 2197710 T3 20040101; ES 2204184 T3 20040416; JP 2002534605 A 20021015; JP 2002534606 A 20021015; JP 2003511551 A 20030325; KR 20010100009 A 20011109; KR 20010100013 A 20011109; KR 20010103724 A 20011123; US 6509103 B1 20030121; US 6513581 B1 20030204; US 6617047 B1 20030909; WO 0040773 A2 20000713; WO 0040773 A3 20001109; WO 0040774 A2 20000713; WO 0040774 A3 20020926; WO 0040775 A2 20000713; WO 0040775 A3 20001109
DOCDB simple family (application)
DE 19860526 A 19981230; AT 99964672 T 19991224; AT 99965554 T 19991224; AT 99967007 T 19991224; CA 2358097 A 19991224; CA 2358099 A 19991224; CN 99815259 A 19991224; CN 99816373 A 19991224; CN 99816382 A 19991224; DE 59903362 T 19991224; DE 59905005 T 19991224; DE 59906313 T 19991224; EP 9910368 W 19991224; EP 9910371 W 19991224; EP 9910372 W 19991224; EP 99964672 A 19991224; EP 99965554 A 19991224; EP 99967007 A 19991224; ES 99965554 T 19991224; ES 99967007 T 19991224; JP 2000592465 A 19991224; JP 2000592466 A 19991224; JP 2000592467 A 19991224; KR 20017008309 A 20010629; KR 20017008317 A 20010629; KR 20017008321 A 20010629; US 86913901 A 20010626; US 86914701 A 20010626; US 86927501 A 20010626