EP 1145272 A2 20011017 - IMPROVED ALIGNMENT OF A THERMAL FIELD EMISSION ELECTRON SOURCE AND APPLICATION IN A MICROCOLUMN
Title (en)
IMPROVED ALIGNMENT OF A THERMAL FIELD EMISSION ELECTRON SOURCE AND APPLICATION IN A MICROCOLUMN
Title (de)
VERBESSERTE JUSTIERUNG EINER THERMISCHEN FELDEMISSIONS-ELEKTRONENQUELLE UND ANWENDUNG IN EINEM MIKRO- ELEKTRONENSTRAHLAPPARAT
Title (fr)
REGLAGE AMELIORE DE L'EMISSION D'UN CHAMP THERMIQUE
Publication
Application
Priority
- US 9923704 W 19991007
- US 17661398 A 19981021
Abstract (en)
[origin: WO0024030A2] An electron-beam microcolumn alignment method and system in situ includes a split suppressor cap for a miniature Schottky electron or other field emission source. The split suppressor cap is segmented into four or more electrically separate electrode elements, which are independently driven and controlled by separate deflection voltages to scan the electron beam without requiring mechanical movement.
[origin: WO0024030A2] An electron-beam microcolumn alignment method and system in situ includes a split suppressor cap (124) for a miniature Schottky electron (16) or other field emission source. The split suppressor cap is segmented into four or more electrically separate electrode elements (124...130) which are independently driven and controlled by separate deflection voltages (Vs+/-Vx, Vs+/-Vy) to scan the electron beam without requiring mechanical movement.
IPC 1-7
IPC 8 full level
H01J 37/04 (2006.01); H01J 37/073 (2006.01); H01J 37/28 (2006.01)
CPC (source: EP KR)
H01J 37/00 (2013.01 - KR); H01J 37/073 (2013.01 - EP); H01J 37/28 (2013.01 - EP); H01J 2237/06316 (2013.01 - EP); H01J 2237/1501 (2013.01 - EP)
Designated contracting state (EPC)
DE GB NL
DOCDB simple family (publication)
WO 0024030 A2 20000427; WO 0024030 A3 20021010; EP 1145272 A2 20011017; EP 1145272 A3 20021127; JP 2003513407 A 20030408; KR 20010080286 A 20010822
DOCDB simple family (application)
US 9923704 W 19991007; EP 99954854 A 19991007; JP 2000577692 A 19991007; KR 20017005019 A 20010421