Global Patent Index - EP 1145284 A3

EP 1145284 A3 20020911 - METHOD AND DEVICE FOR DRYING PHOTORESIST COATINGS

Title (en)

METHOD AND DEVICE FOR DRYING PHOTORESIST COATINGS

Title (de)

VERFAHREN UND VORRICHTUNG ZUR TROCKNUNG VON PHOTORESISTSCHICHTEN

Title (fr)

PROCEDE ET DISPOSITIF DE SECHAGE DE COUCHES PHOTORESISTANTES

Publication

EP 1145284 A3 20020911 (DE)

Application

EP 99936266 A 19990512

Priority

  • DE 9901485 W 19990512
  • DE 19821237 A 19980512

Abstract (en)

[origin: WO9959191A2] The present invention relates to a method and device for drying photoresist coatings. A substrate (12) provided with the photoresist coating is impinged upon by infrared radiation from an infrared radiation source (4) with an adjustable output. The temperature of the area around the photresist layer is measured during drying. The output of the infrared radiation source is temperature-controlled so as to achieve a specific chronological temperature cycle. For this purpose, the inventive device is provided with a control unit (8) and a temperature measuring device (6, 7). The inventive method and device pertaining thereto enable especially thick photoresist coatings (>/=20 mu m) to be dried in an optimum manner over a short period of time. The photoresist mask that is subsequently produced has a high resolution.

IPC 1-7

H01L 21/00

IPC 8 full level

F26B 3/30 (2006.01); F26B 25/00 (2006.01); H01L 21/00 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP)

H01L 21/67115 (2013.01); H01L 21/67248 (2013.01)

Citation (search report)

See references of WO 9959191A2

Designated contracting state (EPC)

AT BE CH DE FR GB IT LI NL

DOCDB simple family (publication)

WO 9959191 A2 19991118; WO 9959191 A3 20010823; DE 19821237 C1 20000302; EP 1145284 A2 20011017; EP 1145284 A3 20020911; JP 2002515646 A 20020528

DOCDB simple family (application)

DE 9901485 W 19990512; DE 19821237 A 19980512; EP 99936266 A 19990512; JP 2000548909 A 19990512