EP 1153417 A1 20011114 - METHOD AND DEVICE FOR TREATING SUBSTRATES
Title (en)
METHOD AND DEVICE FOR TREATING SUBSTRATES
Title (de)
VORRICHTUNG UND VERFAHREN ZUM BEHANDELN VON SUBSTRATEN
Title (fr)
PROCEDE ET DISPOSITIF POUR TRAITER DES SUBSTRATS
Publication
Application
Priority
- DE 19906852 A 19990218
- DE 19926462 A 19990610
- EP 0000815 W 20000202
Abstract (en)
[origin: WO0049644A1] The aim of the invention is to increase the throughput capacity of a conventional substrate treatment device by essentially maintaining the floor space required. To this end, a device and a method for treating substrates in at least one of two basins is provided. Said basins can be filled with at least two treatment fluids. The method comprises the following steps: a) processing a first treatment fluid in a processing unit that is shared by the two basins, b) charging the basin with substrates, c) passing at least the second treatment fluid into the basin and e) removing the substrates from the basin, whereby the processing steps in the relevant basins are controlled at staggered intervals in such a way that a time period is provided between the end of step c) in one of the basins and the beginning of step c) in another basin, whereby said time period is sufficiently long for processing the first treatment fluid.
IPC 1-7
IPC 8 full level
H01L 21/00 (2006.01)
CPC (source: EP)
H01L 21/67028 (2013.01); H01L 21/67057 (2013.01)
Citation (search report)
See references of WO 0049644A1
Designated contracting state (EPC)
AT DE FR GB IT NL
DOCDB simple family (publication)
WO 0049644 A1 20000824; EP 1153417 A1 20011114; JP 2002537651 A 20021105; TW 452854 B 20010901
DOCDB simple family (application)
EP 0000815 W 20000202; EP 00903663 A 20000202; JP 2000600294 A 20000202; TW 89102056 A 20000208