EP 1161765 A1 20011212 - DEVICE FOR TREATING SUBSTRATES
Title (en)
DEVICE FOR TREATING SUBSTRATES
Title (de)
VORRICHTUNG ZUM BEHANDELN VON SUBSTRATEN
Title (fr)
DISPOSITIF DE TRAITEMENT DE SUBSTRATS
Publication
Application
Priority
- DE 19911084 A 19990312
- EP 0001984 W 20000308
Abstract (en)
[origin: DE19911084A1] The invention relates to a device for treating substrates, especially semiconductor wafers, with at least one processing container that is provided with an opening which can be closed from the exterior during the treatment with the substrate. The aim of the invention is to provide a simple and homogeneous treatment of a surface pertaining to a substrate. The aim of the invention is also to reduce the danger of damage between successive treatment steps. To this end, a second processing container is provided adjacent to the first processing container. The wall of said second processing container is at least partially the container wall of the first processing container, whereby said container wall is provided with the opening which can be closed from the side of the first processing container.
IPC 1-7
IPC 8 full level
C25D 7/12 (2006.01); C25D 17/00 (2006.01); C25D 17/08 (2006.01); H01L 21/00 (2006.01)
CPC (source: EP KR)
H01L 21/00 (2013.01 - KR); H01L 21/67023 (2013.01 - EP)
Citation (search report)
See references of WO 0055888A1
Designated contracting state (EPC)
AT DE
DOCDB simple family (publication)
DE 19911084 A1 20000921; DE 19911084 C2 20020131; EP 1161765 A1 20011212; JP 2002539334 A 20021119; KR 20010103049 A 20011117; TW 472316 B 20020111; WO 0055888 A1 20000921
DOCDB simple family (application)
DE 19911084 A 19990312; EP 0001984 W 20000308; EP 00918768 A 20000308; JP 2000606035 A 20000308; KR 20017011532 A 20010911; TW 89104247 A 20000309