EP 1171906 A1 20020116 - METHOD FOR CMP OF LOW DIELECTRIC CONSTANT POLYMER LAYERS
Title (en)
METHOD FOR CMP OF LOW DIELECTRIC CONSTANT POLYMER LAYERS
Title (de)
VERFAHREN FÜR CMP VON NIEDERDIELEKTRIZITÄTSKOEFFIZIENTEN POLYMERSCHICHTEN
Title (fr)
PROCEDE DE POLISSAGE CHIMIQUE-MECANIQUE DE COUCHES POLYMERES CONSTANTES FAIBLEMENT DIELECTRIQUES
Publication
Application
Priority
- US 0003893 W 20000216
- US 12056799 P 19990218
Abstract (en)
[origin: WO0049647A1] A method for chemical-mechanical polishing of a low dielectric constant polymeric layer wherein a slurry comprising high purity fine metal oxide particles uniformly dispersed in a stable aqueous medium is used.
IPC 1-7
IPC 8 full level
C09G 1/02 (2006.01); H01L 21/3105 (2006.01); H01L 21/321 (2006.01)
CPC (source: EP KR)
C09G 1/02 (2013.01 - EP); H01L 21/304 (2013.01 - KR); H01L 21/31058 (2013.01 - EP); H01L 21/3212 (2013.01 - EP)
Citation (search report)
See references of WO 0049647A1
Designated contracting state (EPC)
DE FR GB IT
DOCDB simple family (publication)
WO 0049647 A1 20000824; EP 1171906 A1 20020116; JP 2002537652 A 20021105; KR 20010111261 A 20011217
DOCDB simple family (application)
US 0003893 W 20000216; EP 00913478 A 20000216; JP 2000600297 A 20000216; KR 20017010397 A 20010816