Global Patent Index - EP 1178517 A1

EP 1178517 A1 20020206 - An ion beam apparatus

Title (en)

An ion beam apparatus

Title (de)

Ionenstrahlgerät

Title (fr)

Appareil à faisceau d'ions

Publication

EP 1178517 A1 (EN)

Application

EP 01203085 A

Priority

  • EP 96924984 A
  • GB 9515090 A

Abstract (en)

An ion beam apparatus comprises a source of ions (1), an evacuatable chamber (11), first and second electrodes (3,5) disposed within the chamber for forming an ion beam from ions from the ion source, the first electrode being electrically insulated from the second electrode. First and second supports for (17,19) supporting said first and second electrodes, respectively, are provided. The apparatus is arranged to allow said electrodes to be moved independently of one another relative to said chamber from outside said chamber. <IMAGE>

IPC 1-7

H01J 37/15; H01J 27/02; H01J 37/08

IPC 8 full level

H01J 27/02 (2006.01); H01J 27/08 (2006.01); H01J 37/08 (2006.01); H01J 37/15 (2006.01)

CPC (source: EP)

H01J 27/022 (2013.01); H01J 27/08 (2013.01); H01J 37/08 (2013.01); H01J 37/15 (2013.01); H01J 2237/31701 (2013.01)

Citation (search report)

Designated contracting state (EPC)

DE GB

DOCDB simple family (publication)

WO 9704474 A1 19970206; DE 69622009 D1 20020801; DE 69622009 T2 20030116; DE 69637765 D1 20090108; EP 0782763 A1 19970709; EP 0782763 B1 20020626; EP 1178517 A1 20020206; EP 1178517 B1 20081126; GB 9515090 D0 19950920; JP H10508425 A 19980818; KR 970706598 A 19971103; US 5920076 A 19990706

DOCDB simple family (application)

GB 9601715 W 19960719; DE 69622009 T 19960719; DE 69637765 T 19960719; EP 01203085 A 19960719; EP 96924984 A 19960719; GB 9515090 A 19950721; JP 50642897 A 19960719; KR 19970701843 A 19970321; US 80954797 A 19970620