Title (en)

ELECTROCHEMICAL ETCHING INSTALLATION AND METHOD FOR ETCHING A BODY TO BE ETCHED

Title (de)

ELEKTROCHEMISCHE ÄTZANLAGE UND VERFAHREN ZUR ÄTZUNG EINES ÄTZKÖRPERS

Title (fr)

INSTALLATION DE GRAVURE ELECTROCHIMIQUE ET PROCEDE DE GRAVURE D'UN CORPS A GRAVER

Publication

EP 1181400 B1 20070228 (DE)

Application

EP 00922440 A 20000317

Priority

• DE 0000857 W 20000317
• DE 19914905 A 19990401

Abstract (en)

[origin: DE19914905A1] The first and second electrode material are selected so that the etching body (15) is not contaminated and/or not damaged after etching through the electrode materials. Electrochemical etching cell for etching an etching body having a surface of etching material comprises a chamber partially filled with an electrolyte and contains a first electrode (13) with a surface made of first electrode material and a second electrode (13') with a surface made of a second electrode material. One of the electrodes is connected as anode and the other as cathode. The etching body is in contact with the electrolyte. The first and second electrode material are selected so that the etching body (15) is not contaminated and/or not damaged after etching through the electrode materials.

IPC 8 full level

C25D 11/32 (2006.01); C25F 3/12 (2006.01); C25F 7/00 (2006.01); H01L 21/3063 (2006.01)

CPC (source: EP KR US)

C25F 7/00 (2013.01 - EP US); H01L 21/3063 (2013.01 - KR); Y10S 204/12 (2013.01 - EP US)

Designated contracting state (EPC)

DE ES FR GB IT NL

DOCDB simple family (publication)

DE 19914905 A1 20001005; DE 50014121 D1 20070412; EP 1181400 A1 20020227; EP 1181400 B1 20070228; ES 2282103 T3 20071016; JP 2002541324 A 20021203; JP 4511741 B2 20100728; KR 100698798 B1 20070326; KR 20010112373 A 20011220; US 6726815 B1 20040427; WO 0060143 A1 20001012

DOCDB simple family (application)

DE 19914905 A 19990401; DE 0000857 W 20000317; DE 50014121 T 20000317; EP 00922440 A 20000317; ES 00922440 T 20000317; JP 2000609630 A 20000317; KR 20017012317 A 20010927; US 93792601 A 20011226