EP 1183720 A1 20020306 - METHOD FOR CLEANING A SILICON SUBSTRATE SURFACE AND USE FOR MAKING INTEGRATED ELECTRONIC COMPONENTS
Title (en)
METHOD FOR CLEANING A SILICON SUBSTRATE SURFACE AND USE FOR MAKING INTEGRATED ELECTRONIC COMPONENTS
Title (de)
VERFAHREN ZUR REINIGUNG DER OBERFLÄCHE EINER SILIZIUMSCHEIBE UND VERWENDUNG FÜR DIE HERSTELLUNG VON INTEGRIERTEN ELEKTRONISCHEN ANORDNUNGEN
Title (fr)
PROCEDE DE NETTOYAGE D'UNE SURFACE DE SUBSTRAT DE SILICIUM ET APPLICATION A LA FABRICATION DE COMPOSANTS ELECTRONIQUES INTEGRES
Publication
Application
Priority
- FR 0001182 W 20000503
- FR 9905835 A 19990507
Abstract (en)
[origin: FR2793264A1] The invention concerns a method for cleaning a silicon substrate surface with 100 orientation for integrated electronic components. The method is characterised in that it consists in carrying out the cleaning step after polishing by producing under vacuum a flux of positive ions (30) moderately loaded, with low energy level and predetermined density. The flux is directed towards the surface (21) of the silicon substrate (20), and the kinetic energy of the ions (30) is controlled so that their speed is substantially null at a predetermined distance from said surface. The ejection of soils (10, 11) present on the substrate surface and the elimination of punctiform crystalline defects (40) is then brought about by the generation of repulsive forces of sufficient intensity within said soil and said defects, thereby producing a perfectly planar surface.
IPC 1-7
IPC 8 full level
H01L 21/304 (2006.01); C30B 33/00 (2006.01); H01L 21/28 (2006.01); H01L 21/316 (2006.01); H01L 29/51 (2006.01)
CPC (source: EP)
C30B 29/06 (2013.01); C30B 33/00 (2013.01); H01L 21/28194 (2013.01); H01L 29/517 (2013.01); H01L 29/511 (2013.01)
Citation (search report)
See references of WO 0068984A1
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
DOCDB simple family (publication)
FR 2793264 A1 20001110; FR 2793264 B1 20010615; AU 4411900 A 20001121; EP 1183720 A1 20020306; JP 2002544667 A 20021224; WO 0068984 A1 20001116
DOCDB simple family (application)
FR 9905835 A 19990507; AU 4411900 A 20000503; EP 00925372 A 20000503; FR 0001182 W 20000503; JP 2000617487 A 20000503