Global Patent Index - EP 1187173 A3

EP 1187173 A3 20050831 - Low pressure gas discharge lamp with a copper-containing gas fill

Title (en)

Low pressure gas discharge lamp with a copper-containing gas fill

Title (de)

Niederdruckgasentladungslampe mit kupferhaltiger Gasfüllung

Title (fr)

Lampe à décharge dans un gaz à basse pression avec un remplissage gazeux contenant du cuivre

Publication

EP 1187173 A3 20050831 (DE)

Application

EP 01000423 A 20010905

Priority

DE 10044563 A 20000908

Abstract (en)

[origin: EP1187173A2] A low pressure gas discharge lamp comprises a gas discharge vessel containing a gas filling with a copper compound selected from halides, oxides, chalcogenides, hydroxides, hydrides and organometallic compounds of copper and a buffer gas; electrodes (2) and devices for producing and maintaining a low pressure discharge. Preferred Features: The gas filling contains a copper halide or halide, oxide, chalcogenide, hydroxide or organometallic compound of thallium as a further additive. The buffer gas is helium, neon, argon, krypton and xenon. The gas discharge vessel has a phosphor coating (4) on the outer surface.

IPC 1-7

H01J 61/12; H01J 61/70; H01J 61/18

IPC 8 full level

H01J 61/12 (2006.01); H01J 61/16 (2006.01); H01J 61/70 (2006.01)

CPC (source: EP US)

H01J 61/125 (2013.01 - EP US); H01J 61/16 (2013.01 - EP US); H01J 61/70 (2013.01 - EP US)

Citation (search report)

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

DOCDB simple family (publication)

EP 1187173 A2 20020313; EP 1187173 A3 20050831; CN 1230867 C 20051207; CN 1342995 A 20020403; DE 10044563 A1 20020321; JP 2002093367 A 20020329; US 2002047524 A1 20020425; US 6603267 B2 20030805

DOCDB simple family (application)

EP 01000423 A 20010905; CN 01135744 A 20010905; DE 10044563 A 20000908; JP 2001271243 A 20010907; US 94777601 A 20010907