EP 1197727 A3 20080102 - Roughness measuring method and apparatus
Title (en)
Roughness measuring method and apparatus
Title (de)
Verfahren und Apparat zum Messen der Rauhigkeit
Title (fr)
Méthode et appareil pour mesurer la rugosité
Publication
Application
Priority
JP 2000299670 A 20000929
Abstract (en)
[origin: EP1197727A2] The roughness measuring method and roughness measuring apparatus (10) enable accurate measurement of the surface roughness of a work (W) with no cutoff values specified. An auxiliary storage device (34) storing therein a plurality of cutoff values (0.08, 0.25, 0.8, 2.5 (mm)) is included in a data processing apparatus (14) of the roughness measuring apparatus (10). These cutoff values are read by a CPU (28). Then, the CPU (28) uses a filter having a plurality of cutoff values to calculate a plurality of temporary evaluation values for each evaluation length corresponding to a plurality of cutoff values from measurement data, and obtains a maximum value out of these temporary evaluation values. Then, the CPU (28) controls an evaluation value outputting device (36) to have this maximum value outputted to a monitor (18) as an effective evaluation value of the roughness of the measurement area in the cutoff value with the calculated maximum value falling within its roughness range.
IPC 8 full level
G01B 7/34 (2006.01); G01B 21/30 (2006.01)
CPC (source: EP US)
G01B 7/34 (2013.01 - EP US)
Citation (search report)
- [X] EP 0497610 A2 19920805 - GEN ELECTRIC [US]
- [X] GB 2343140 A 20000503 - EASTMAN KODAK CO [US]
- [X] JP H10132554 A 19980522 - TOKYO SEIMITSU CO LTD
- [X] GB 2272059 A 19940504 - MITUTOYO CORP [JP]
- [X] EP 0915105 A1 19990512 - ROHM & HAAS [US]
- [A] US 5488476 A 19960130 - MANSFIELD DANIEL [GB], et al
- [A] WO 9908065 A1 19990218 - VLSI STANDARDS INC [US]
- [A] US 4803374 A 19890207 - MONFORT GUY A [BE], et al
- [A] US 5355221 A 19941011 - COHEN DONALD K [US], et al
- [A] JP H08159751 A 19960621 - NIPPON SHEET GLASS CO LTD
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated extension state (EPC)
AL LT LV MK RO SI
DOCDB simple family (publication)
EP 1197727 A2 20020417; EP 1197727 A3 20080102; JP 2002107144 A 20020410; JP 3525432 B2 20040510; US 2002038854 A1 20020404; US 6696697 B2 20040224
DOCDB simple family (application)
EP 01123184 A 20010927; JP 2000299670 A 20000929; US 95695201 A 20010921