EP 1213618 A1 20020612 - Method and apparatus for detecting aberrations in an optical system
Title (en)
Method and apparatus for detecting aberrations in an optical system
Title (de)
Verfahren und Vorrichtung zur Ermittlung von Aberrationen in einem optischen System
Title (fr)
Méthode et appareil pour la détection d'aberrations dans un système optique
Publication
Application
Priority
US 72969500 A 20001206
Abstract (en)
A method of detecting aberrations associated with a projection lens utilized in an optical lithography system. The method includes the steps of forming a mask for transferring a lithographic pattern onto a substrate, forming a plurality of non-resolvable features disposed on the mask, where the plurality of non-resolvable features are arranged so as to form a predetermined pattern on the substrate, exposing the mask using an optical exposure tool so as to print the mask on the substrate, and analyzing the position of the predetermined pattern formed on the substrate and the position of the plurality of non-resolvable features disposed on the mask so as to determine if there is an aberration. If the position of the predetermined pattern formed on the substrate differs from an expected position, which is determined from the position of the plurality of non-resolvable features, this shift from the expected position indicates the presence of an aberration. <IMAGE> <IMAGE> <IMAGE>
IPC 1-7
IPC 8 full level
G01M 11/02 (2006.01); G03F 1/08 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
G03F 7/20 (2013.01 - KR); G03F 7/706 (2013.01 - EP US)
Citation (search report)
- [Y] US 6130747 A 20001010 - NOMURA HIROSHI [JP], et al
- [YD] WO 0031592 A1 20000602 - KONINKL PHILIPS ELECTRONICS NV [NL]
- [DA] WO 9947981 A1 19990923 - MICROUNITY SYSTEMS ENG [US]
- [A] EP 0849638 A2 19980624 - NIPPON KOGAKU KK [JP]
- [A] EP 0595196 A1 19940504 - IBM [US]
- [A] US 5776645 A 19980707 - BARR ROGER LAWRENCE [US], et al
- [Y] PATENT ABSTRACTS OF JAPAN vol. 2000, no. 08 6 October 2000 (2000-10-06)
- [A] PATENT ABSTRACTS OF JAPAN vol. 2000, no. 02 29 February 2000 (2000-02-29)
Designated contracting state (EPC)
DE FR GB IT NL
DOCDB simple family (publication)
EP 1213618 A1 20020612; EP 1213618 B1 20040623; DE 60103964 D1 20040729; DE 60103964 T2 20050714; JP 2002231626 A 20020816; JP 3910065 B2 20070425; KR 100483515 B1 20050415; KR 20020045536 A 20020619; TW I239434 B 20050911; US 2002088951 A1 20020711; US 2003098970 A1 20030529; US 6753954 B2 20040622; US 6788400 B2 20040907
DOCDB simple family (application)
EP 01310139 A 20011204; DE 60103964 T 20011204; JP 2001402407 A 20011204; KR 20010076289 A 20011204; TW 90128361 A 20011115; US 119601 A 20011204; US 72969500 A 20001206