Global Patent Index - EP 1222677 A2

EP 1222677 A2 20020717 - ELECTRON IMPACT ION SOURCE

Title (en)

ELECTRON IMPACT ION SOURCE

Title (de)

ELEKTRONENSTOSSIONENQUELLE

Title (fr)

SOURCE IONIQUE A FLUX ELECTRONIQUE

Publication

EP 1222677 A2 20020717 (DE)

Application

EP 00982966 A 20001006

Priority

  • DE 0003525 W 20001006
  • DE 19949978 A 19991008

Abstract (en)

[origin: WO0127964A2] The invention relates to an electron impact ion source for the generation of multiply- or maximally-charged ions, which comprises an electron gun with a cathode and anode for creation and acceleration of electrons, a device for axial-symmetric focusing of the electron beam, a means for introducing ionisable substances into an ion trap located in the region of the axial-symmetric focussed electron beam, which may be opened and closed, a device for destroying the electrons after passing through the ion trap, and a device for generating a vacuum around the axial-symmetric focussed electron beam and the ion trap within said beam. Said electron impact ion source is further characterised by the device for axial-symmetric focussing of the electron beam comprising at least two opposing, radially magnetised ring structures (2), whereby each of the ring structures (2) encloses the electron beam and both opposed radially magnetised rings (2) are linked by magnetic conductors (7, 9) to form a unified magnetic body. The invention is further characterised by the closed magnetic field passing through the ion residence zone in the ion trap, the cathode having a very high emmissivity of < 25 A/cm ?2> with a small cathode diameter and an applicable vacuum of from 10<-7> to 10<-11> Torr in the ion residence zone during operation of the electron impact ion source.

IPC 1-7

H01J 27/08

IPC 8 full level

G01N 27/62 (2006.01); G21K 1/00 (2006.01); G21K 5/02 (2006.01); G21K 5/04 (2006.01); H01J 27/18 (2006.01); H01J 27/20 (2006.01); H01J 37/08 (2006.01); H05H 3/02 (2006.01)

CPC (source: EP)

H01J 27/18 (2013.01)

Citation (search report)

See references of WO 0127964A3

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

WO 0127964 A2 20010419; WO 0127964 A3 20020314; AT 458260 T 20100315; AU 1992701 A 20010423; DE 10083121 D2 20020425; DE 19949978 A1 20010510; DE 50015866 D1 20100401; EP 1222677 A2 20020717; EP 1222677 B1 20100217; JP 2003511843 A 20030325; JP 4886138 B2 20120229; US 6717155 B1 20040406

DOCDB simple family (application)

DE 0003525 W 20001006; AT 00982966 T 20001006; AU 1992701 A 20001006; DE 10083121 T 20001006; DE 19949978 A 19991008; DE 50015866 T 20001006; EP 00982966 A 20001006; JP 2001530888 A 20001006; US 11026102 A 20020605