Global Patent Index - EP 1224688 A1

EP 1224688 A1 20020724 - METHOD AND DEVICE FOR THERMAL TREATMENT OF SUBSTRATES

Title (en)

METHOD AND DEVICE FOR THERMAL TREATMENT OF SUBSTRATES

Title (de)

VERFAHREN UND VORRICHTUNG ZUM THERMISCHEN BEHANDELN VON SUBSTRATEN

Title (fr)

PROCEDE ET DISPOSITIF POUR LE TRAITEMENT THERMIQUE DE SUBSTRATS

Publication

EP 1224688 A1 20020724 (DE)

Application

EP 00972808 A 20001019

Priority

  • DE 19952017 A 19991028
  • EP 0010290 W 20001019

Abstract (en)

[origin: DE19952017A1] In order to achieve temperature distribution, in particular a homogeneous temperature distribution in, for example, a substrate during a thermal treatment process of said substrate, a method is disclosed for the thermal treatment of substrates, in particular semi-conductor wafers, in a process chamber comprising at least one temperature distribution influencing element located in the process chamber. During thermal treatment, the spatial arrangement of the element is altered relative to the substrate and/or to the process chamber. A device for the thermal treatment of substrates in a process chamber is also disclosed, comprising at least one temperature distribution influencing element located in a process chamber wherein a device is provided in order to alter the spatial arrangement of the element relative to the substrate and/or to the process chamber during the thermal treatment process.

IPC 1-7

H01L 21/00

IPC 8 full level

H01L 21/26 (2006.01); H01L 21/00 (2006.01)

CPC (source: EP KR US)

H01L 21/324 (2013.01 - KR); H01L 21/67115 (2013.01 - EP US)

Citation (search report)

See references of WO 0131689A1

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

DE 19952017 A1 20010517; EP 1224688 A1 20020724; JP 2003513442 A 20030408; JP 5144867 B2 20130213; KR 100703259 B1 20070403; KR 20020043256 A 20020608; TW 483070 B 20020411; US 7041610 B1 20060509; WO 0131689 A1 20010503

DOCDB simple family (application)

DE 19952017 A 19991028; EP 0010290 W 20001019; EP 00972808 A 20001019; JP 2001534189 A 20001019; KR 20027005516 A 20020429; TW 89122630 A 20010129; US 11173702 A 20020917