Global Patent Index - EP 1233927 A1

EP 1233927 A1 20020828 - APPARATUS AND METHOD FOR FORMING A MEMBRANE WITH NANOMETER SCALE PORES

Title (en)

APPARATUS AND METHOD FOR FORMING A MEMBRANE WITH NANOMETER SCALE PORES

Title (de)

APPARAT UND VERFAHREN FÜR DIE HERSTELLUNG EINER MEMBRAN MIT POREN IM NANOMETERBEREICH

Title (fr)

APPAREIL ET PROCEDE DE FORMATION D'UNE MEMBRANE A PORES A L'ECHELLE NANOMETRIQUE

Publication

EP 1233927 A1 20020828 (EN)

Application

EP 00980528 A 20001117

Priority

  • US 0031749 W 20001117
  • US 16604999 P 19991117

Abstract (en)

[origin: WO0136321A1] A method of forming a membrane with nanometer scale pores includes forming a sacrificial etch stop layer on a substrate. A base layer is constructed on the sacrificial etch stop layer. Micrometer scale pores are formed within the base layer. A sacrificial base layer is built on the base layer. The sacrificial base layer is removed from selected regions of the base layer to define nanometer scale pores within the base layer. The resultant membrane has sub-fifty nanometer pores formed within it.

IPC 1-7

B81C 1/00; B82B 1/00; B82B 3/00; B01D 63/00

IPC 8 full level

B82B 3/00 (2006.01); B01D 67/00 (2006.01); B01D 69/02 (2006.01); B01D 71/02 (2006.01); B81B 3/00 (2006.01)

CPC (source: EP US)

B01D 67/0058 (2013.01 - EP); B01D 67/0062 (2013.01 - EP); B01D 67/0072 (2013.01 - EP); B01D 69/02 (2013.01 - EP); B01D 71/02 (2013.01 - EP); B01D 71/0215 (2022.08 - US); B01D 71/022 (2013.01 - EP); B01D 71/0221 (2022.08 - US); B81C 1/00158 (2013.01 - EP); B01D 2325/02 (2013.01 - EP); B01D 2325/0283 (2022.08 - US); B01D 2325/04 (2013.01 - EP); B01D 2325/08 (2013.01 - EP); B81B 2201/06 (2013.01 - EP); B81B 2201/10 (2013.01 - EP); B81C 2201/0109 (2013.01 - EP); B81C 2201/014 (2013.01 - EP); B81C 2201/053 (2013.01 - EP)

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

DOCDB simple family (publication)

WO 0136321 A1 20010525; WO 0136321 A9 20020704; AU 1778101 A 20010530; EP 1233927 A1 20020828; EP 1233927 A4 20030108; JP 2003514677 A 20030422

DOCDB simple family (application)

US 0031749 W 20001117; AU 1778101 A 20001117; EP 00980528 A 20001117; JP 2001538280 A 20001117