Global Patent Index - EP 1238411 A1

EP 1238411 A1 20020911 - DEVICE AND METHOD FOR TREATING SUBSTRATES

Title (en)

DEVICE AND METHOD FOR TREATING SUBSTRATES

Title (de)

VORRICHTUNG UND VERFAHREN ZUM BEHANDELN VON SUBSTRATEN

Title (fr)

DISPOSITIF ET PROCEDE PERMETTANT DE TRAITER DES SUBSTRATS

Publication

EP 1238411 A1 20020911 (DE)

Application

EP 00987373 A 20001208

Priority

  • DE 19960241 A 19991214
  • EP 0012428 W 20001208

Abstract (en)

[origin: WO0145143A1] In order to optimize flow conditions in a device (1) for treating substrates (2) in a treatment basin (3) that is filled with treatment fluid, said device comprising at least one diffusor (12) to introduce the fluid into the treatment basin (3), the distance between the diffusor (12) and the substrates (2) can be regulated. The invention also relates to a method for regulating said distance. According to an additional measure to improve flow conditions in said device, the diffusor (12) has a plate (18) that is curved cylindrically toward the substrates (2) and outlets (20), the cylindrical axes thereof extending perpendicularly in relation to the planes of the substrates.

IPC 1-7

H01L 21/00

IPC 8 full level

H01L 21/306 (2006.01); H01L 21/00 (2006.01); H01L 21/304 (2006.01)

CPC (source: EP KR US)

H01L 21/00 (2013.01 - KR); H01L 21/67057 (2013.01 - EP US)

Citation (search report)

See references of WO 0145143A1

Designated contracting state (EPC)

AT BE CH DE FR IT LI

DOCDB simple family (publication)

WO 0145143 A1 20010621; DE 19960241 A1 20010705; EP 1238411 A1 20020911; JP 2003524296 A 20030812; KR 20020063214 A 20020801; US 2002189651 A1 20021219

DOCDB simple family (application)

EP 0012428 W 20001208; DE 19960241 A 19991214; EP 00987373 A 20001208; JP 2001545346 A 20001208; KR 20027007508 A 20020612; US 16835402 A 20020614