Global Patent Index - EP 1244937 A2

EP 1244937 A2 20021002 - ALTERNATING PHASE MASK

Title (en)

ALTERNATING PHASE MASK

Title (de)

ALTERNIERENDE PHASENMASKE

Title (fr)

MASQUE DE PHASE ALTERNANT

Publication

EP 1244937 A2 20021002 (DE)

Application

EP 00989795 A 20001122

Priority

  • DE 0004136 W 20001122
  • DE 19957542 A 19991130

Abstract (en)

[origin: WO0140868A2] The invention relates to an alternating phase mask (1) having a branched structure consisting of two opaque segments. Two transparent surfaces segments (5a, 5b) are arranged on both sides of said segments or the components thereof respectively. The surface segments are provided with phases that are displaced by 180 DEG +/- DELTA alpha , whereby DELTA alpha is not more than 25 DEG . The surface segments (5a, 5b) are separated by at least one transparent surface boundary segment (6) whose phase is situated between the phases of the adjacent surface segments (5a, 5b).

IPC 1-7

G03F 1/00

IPC 8 full level

G03F 1/30 (2012.01); G03F 1/00 (2012.01); H01L 21/027 (2006.01)

CPC (source: EP KR US)

G03F 1/30 (2013.01 - EP KR US)

Citation (search report)

See references of WO 0140868A2

Designated contracting state (EPC)

AT BE CH FR IT LI NL

DOCDB simple family (publication)

WO 0140868 A2 20010607; WO 0140868 A3 20011206; DE 19957542 A1 20010705; DE 19957542 C2 20020110; EP 1244937 A2 20021002; JP 2003521726 A 20030715; JP 3699933 B2 20050928; KR 100490913 B1 20050519; KR 20030009328 A 20030129; US 2003008218 A1 20030109; US 6660437 B2 20031209

DOCDB simple family (application)

DE 0004136 W 20001122; DE 19957542 A 19991130; EP 00989795 A 20001122; JP 2001542273 A 20001122; KR 20027006908 A 20001122; US 15873302 A 20020530