Global Patent Index - EP 1246685 A1

EP 1246685 A1 20021009 - METHOD AND INSTALLATION FOR REDUCING ELEMENTARY HALOGEN IN A GASEOUS EFFLUENT

Title (en)

METHOD AND INSTALLATION FOR REDUCING ELEMENTARY HALOGEN IN A GASEOUS EFFLUENT

Title (de)

VERFAHREN UND VORRICHTUNG ZUR VERRINGERUNG VON ELEMENTAREN HALOGENEN IN ABGASEN

Title (fr)

PROCEDE ET INSTALLATION DE REDUCTION DE L'HALOGENE ELEMENTAIRE DANS UN EFFLUENT GAZEUX

Publication

EP 1246685 A1 20021009 (FR)

Application

EP 00985385 A 20001201

Priority

  • FR 0003363 W 20001201
  • FR 9915412 A 19991207

Abstract (en)

[origin: WO0141903A1] The invention relates to a method for reducing the elementary halogen contained in a gaseous effluent from a combustion furnace for combusting halogenated residues, comprising the bringing of said effluent into contact with hydrazine. The invention also relates to a device or an installation for treating a gaseous effluent from a combustion furnace (1) for combusting halogenated residues, comprising a unit (6, 10, 14) in which the gases are brought into contact with an aqueous solution of hydrazine. Finally, the invention relates to a solution of halohydric acid containing hydrazine.

IPC 1-7

B01D 53/68; B01D 53/14; C01B 7/00; C02F 1/28

IPC 8 full level

F23J 15/04 (2006.01); B01D 53/14 (2006.01); B01D 53/34 (2006.01); B01D 53/68 (2006.01); B01D 53/77 (2006.01); F23J 15/00 (2006.01)

CPC (source: EP US)

B01D 53/68 (2013.01 - EP US); F23J 15/003 (2013.01 - EP US); B01D 2251/20 (2013.01 - EP US); B01D 2257/2025 (2013.01 - EP US); F23J 2215/30 (2013.01 - EP US); F23J 2219/40 (2013.01 - EP US)

Citation (search report)

See references of WO 0141903A1

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

DOCDB simple family (publication)

WO 0141903 A1 20010614; AU 2182101 A 20010618; CN 1279999 C 20061018; CN 1407910 A 20030402; EP 1246685 A1 20021009; FR 2801808 A1 20010608; FR 2801808 B1 20020517; JP 2003516221 A 20030513; US 2003044336 A1 20030306; US 6858194 B2 20050222

DOCDB simple family (application)

FR 0003363 W 20001201; AU 2182101 A 20001201; CN 00816721 A 20001201; EP 00985385 A 20001201; FR 9915412 A 19991207; JP 2001543241 A 20001201; US 14884702 A 20020826