EP 1250471 A1 20021023 - SPUTTER CHAMBER AND VACUUM TRANSPORT CHAMBER AND VACUUM TREATMENT INSTALLATIONS WITH CHAMBERS OF THIS TYPE
Title (en)
SPUTTER CHAMBER AND VACUUM TRANSPORT CHAMBER AND VACUUM TREATMENT INSTALLATIONS WITH CHAMBERS OF THIS TYPE
Title (de)
SPUTTERKAMMER SOWIE VAKUUMTRANSPORTKAMMER UND VAKUUMBEHANDLUNGSANLAGEN MIT SOLCHEN KAMMERN
Title (fr)
CHAMBRE A PULVERISATION CATHODIQUE ET CHAMBRE DE TRANSPORT A VIDE, ET INSTALLATIONS DE TRAITEMENT DU VIDE COMPORTANT DES CHAMBRES DE CE TYPE
Publication
Application
Priority
- CH 0100020 W 20010112
- CH 912000 A 20000118
Abstract (en)
[origin: WO0153561A1] A substrate support (5) is mounted in a sputter chamber in such a way that said support can be driven in rotation about an axis (A). A magnetron source is mounted in the sputter chamber with a central axis (Z) inclined ( beta ) towards the axis of rotation of the substrate support (5).
IPC 1-7
IPC 8 full level
C23C 14/22 (2006.01); C23C 14/35 (2006.01); C23C 14/56 (2006.01); G11B 7/26 (2006.01)
CPC (source: EP)
C23C 14/225 (2013.01); C23C 14/35 (2013.01); C23C 14/566 (2013.01)
Citation (search report)
See references of WO 0153561A1
Citation (examination)
- EP 0435098 A2 19910703 - MACHINE TECHNOLOGY INC [US]
- EP 0933444 A1 19990804 - SHIBAURA MECHATRONICS CORP [JP]
- DE 69322404 T2 19990429 - ADVANCED ENERGY IND INC FORT C [US]
- JP H10147864 A 19980602 - NEC CORP
- KIYOTAKA WASA, SHIGERU HAYAKAWA: "Handbook of sputter deposition technology", 1 January 1992, NOYES PUBLICATIONS, US, ISBN: 0815512805, pages: 100 - 103
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
DOCDB simple family (publication)
WO 0153561 A1 20010726; EP 1250471 A1 20021023; HK 1051056 A1 20030718; JP 2003520297 A 20030702; JP 5059269 B2 20121024
DOCDB simple family (application)
CH 0100020 W 20010112; EP 01900067 A 20010112; HK 03101795 A 20030312; JP 2001553418 A 20010112