Global Patent Index - EP 1251402 B1

EP 1251402 B1 2007-10-24 - Lithographic apparatus and device manufacturing method

Title (en)

Lithographic apparatus and device manufacturing method

Title (de)

Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Title (fr)

Appareil lithographique et méthode de fabrication d'un dispositif

Publication

EP 1251402 B1 (EN)

Application

EP 02252340 A

Priority

  • EP 02252340 A
  • EP 01303036 A

Abstract (en)

[origin: EP1251402A1] A device manufacturing method is disclosed in which the aberration of the projection system of a lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis of the Zernike aberration and sensitivity coefficients which quantify the relationship between Zernike aberration components and the error in the image. A calculation is then performed to determine the compensation to apply to the apparatus in order to minimize the error in the image. The compensation is then applied to the apparatus. The compensation may comprise increasing one component of aberration of the apparatus in order to decrease the effect of another aberration, such that, on balance, the image quality as a whole is improved. <IMAGE>

IPC 8 full level (invention and additional information)

G03F 7/20 (2006.01)

CPC (invention and additional information)

G03F 7/705 (2013.01); G03F 7/706 (2013.01)

Designated contracting state (EPC)

DE FR GB IT NL

EPO simple patent family

EP 1251402 A1 20021023; EP 1251402 B1 20071024

INPADOC legal status


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2007-12-06 [REF] CORRESPONDS TO:

- Document: DE 60223102 P 20071206

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2007-10-24 [REG GB FG4D] EUROPEAN PATENT GRANTED

2007-05-09 [RTI1] TITLE (CORRECTION)

- Free text: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

2004-09-22 [RAP1] TRANSFER OF RIGHTS OF AN APPLICATION

- Owner name: ASML NETHERLANDS B.V.

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- Free text: AL;LT;LV;MK;RO;SI