Global Patent Index - EP 1254477 A2

EP 1254477 A2 2002-11-06 - METHOD AND APPARATUS FOR PROCESSING A MICROELECTRONIC WORKPIECE AT AN ELEVATED TEMPERATURE

Title (en)

METHOD AND APPARATUS FOR PROCESSING A MICROELECTRONIC WORKPIECE AT AN ELEVATED TEMPERATURE

Title (de)

VERFAHREN UND VORRICHTUNG ZUR VERARBEITUNG EINES MIKROELEKTRONISCHEN WERKSTÜCKS BEI HOHEN TEMPERATUREN

Title (fr)

DISPOSITIF ET PROCEDE DE TRAITEMENT A TEMPERATURE ELEVEE D'UNE PIECE OUVREE DE MICRO-ELECTRONIQUE

Publication

EP 1254477 A2 (EN)

Application

EP 01910554 A

Priority

  • US 0104444 W
  • US 50100200 A
  • US 73360800 A

Abstract (en)

[origin: WO0159815A2] An apparatus and method for processing a microelectronic workpiece at an elevated temperature. In one embodiment, the apparatus includes a workpiece support positioned to engage and support the microelectronic workpiece during operation. The apparatus can further include a heat source having a solid engaging surface positioned to engage a surface of the microelectronic workpiece with at least one of the heat source and the workpiece support being movable relative to the other between a first position with the microelectronic workpiece contacting the engaging surface of the heat source and a second position with the microelectronic workpiece spaced apart from the engaging surface. The heat source is sized to transfer heat to the microelectronic workpiece at a rate sufficient to thermally process a selected material of the microelectronic workpiece when the microelectronic workpiece is engaged with the heat source. A heat sink can be positioned at least proximate to the heat source to cool both the heat source and the microelectronic workpiece.

IPC 1-7 (main, further and additional classification)

H01L 21/00

IPC 8 full level (invention and additional information)

H01L 21/28 (2006.01); H01L 21/00 (2006.01); H01L 21/02 (2006.01)

CPC (invention and additional information)

H01L 21/67103 (2013.01)

Citation (search report)

See references of WO 0159815A3

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

EPO simple patent family

WO 0159815 A2 20010816; WO 0159815 A3 20020221; AU 3814901 A 20010820; EP 1254477 A2 20021106; JP 2003524299 A 20030812; TW 495885 B 20020721

INPADOC legal status


2007-09-12 [18D] DEEMED TO BE WITHDRAWN

- Effective date: 20070322

2006-10-11 [17Q] FIRST EXAMINATION REPORT

- Effective date: 20050315

2005-04-27 [17Q] FIRST EXAMINATION REPORT

- Effective date: 20050315

2002-12-18 [RIN1] INVENTOR (CORRECTION)

- Inventor name: WEAVER, ROBERT A.

2002-12-18 [RIN1] INVENTOR (CORRECTION)

- Inventor name: WILSON, GREGORY J.

2002-12-18 [RIN1] INVENTOR (CORRECTION)

- Inventor name: MCHUGH, PAUL R.

2002-12-18 [RIN1] INVENTOR (CORRECTION)

- Inventor name: ZILA, VLADIMIR

2002-11-06 [17P] REQUEST FOR EXAMINATION FILED

- Effective date: 20020808

2002-11-06 [AK] DESIGNATED CONTRACTING STATES:

- Kind Code of Ref Document: A2

- Designated State(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

2002-11-06 [AX] REQUEST FOR EXTENSION OF THE EUROPEAN PATENT TO

- Free text: AL;LT;LV;MK;RO;SI