EP 1256639 A1 20021113 - Multiple bath electrodeposition
Title (en)
Multiple bath electrodeposition
Title (de)
Mehrfachbad Elektroplattierung
Title (fr)
Electrodeposition par bains multiples
Publication
Application
Priority
EP 01111055 A 20010508
Abstract (en)
A method and apparatus for fabrication of thin multilayers, multilayered nanowires, and nanocomposites, with the purpose to complete the actually developing nanotechnologies, are described. A closed electrochemical system with multiple baths, protected by inert gas, where the chemical solutions are transferred there and back between different chemical tanks and an electrochemical cell, are used to produce thin, in nanometer-range, multiple layer depositions on a substrate which stays on a fix position for all the deposition cycles inside the electrochemical cell. A special transfer method protect the system from the cross contamination between different chemical solutions, and a particular way of cleaning, protect the deposited layers from the undesirable surface reactions. <IMAGE>
IPC 1-7
IPC 8 full level
C25D 5/10 (2006.01); C25D 17/00 (2006.01)
CPC (source: EP US)
C25D 5/10 (2013.01 - EP US); C25D 17/00 (2013.01 - EP US)
Citation (search report)
- [X] US 4066515 A 19780103 - STOGER KLAUS, et al
- [X] DE 3328944 A1 19850228 - SIEMENS AG [DE]
- [XA] US 5750014 A 19980512 - STADLER DAVID M [US], et al
- [XA] US 6179982 B1 20010130 - TING CHIU H [US], et al
- [X] WO 9816671 A2 19980423 - GRIEGO THOMAS P [US]
- [X] US 5487824 A 19960130 - GRIEGO THOMAS P [US]
- [X] US 5830805 A 19981103 - SHACHAM-DIAMAND YOSI [US], et al
- [A] US 6193858 B1 20010227 - HRADIL GEORGE [US], et al
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
DOCDB simple family (publication)
EP 1256639 A1 20021113; EP 1390567 A1 20040225; US 2006243597 A1 20061102; WO 02092883 A1 20021121
DOCDB simple family (application)
EP 01111055 A 20010508; EP 0204888 W 20020503; EP 02750883 A 20020503; US 47734502 A 20020503