EP 1257879 B1 20070418 - RADIATION SENSITIVE COPOLYMERS, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEMS THEREOF
Title (en)
RADIATION SENSITIVE COPOLYMERS, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEMS THEREOF
Title (de)
STRAHLUNGSEMPFINDLICHE COPOLYMERE, FOTORESISTZUSAMMENSETZUNGEN UND ZWEISCHICHTRESISTSYSTEME FÜR DEN TIEFEN UV-BEREICH
Title (fr)
COPOLYMERES SENSIBLES AU RAYONNEMENT, COMPOSITIONS DE PHOTORESIST ET SYSTEMES A DEUX COUCHES SENSIBLES A L'UV PROFOND CONSTITUES DE CES COPOLYMERES RADIOSENSIBLES
Publication
Application
Priority
- US 0022142 W 20000811
- US 40111099 A 19990922
Abstract (en)
[origin: US6165682A] Radiation sensitive resins for use in a top layer resists in bilayer systems for use in deep UV photolithography comprises copolymers having the following structural units: and optionally, wherein n is an integer of 1 to 5, R1 is methyl or trimethylsiloxy, R2 is a tert-butyl group, R3, R4 and R5 are each independently hydrogen or a methyl group.
IPC 8 full level
G03F 7/004 (2006.01); G03F 7/039 (2006.01); C08F 220/12 (2006.01); C08F 222/06 (2006.01); C08F 230/08 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
C08F 220/06 (2013.01 - KR); C08F 220/18 (2013.01 - KR); C08F 222/06 (2013.01 - KR); C08F 230/08 (2013.01 - KR); C08F 230/085 (2020.02 - KR); G03F 7/0045 (2013.01 - KR); G03F 7/0233 (2013.01 - KR); G03F 7/038 (2013.01 - KR); G03F 7/0395 (2013.01 - KR); G03F 7/0397 (2013.01 - KR); G03F 7/075 (2013.01 - KR); G03F 7/0758 (2013.01 - EP KR US); G03F 7/094 (2013.01 - EP US); G03F 7/0392 (2013.01 - EP US)
Designated contracting state (EPC)
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
DOCDB simple family (publication)
US 6165682 A 20001226; AT E360231 T1 20070515; DE 60034488 D1 20070531; DE 60034488 T2 20080103; EP 1257879 A2 20021120; EP 1257879 A4 20040317; EP 1257879 B1 20070418; JP 2003518524 A 20030610; JP 3687907 B2 20050824; KR 100754230 B1 20070903; KR 20010089491 A 20011006; TW I251119 B 20060311; WO 0122163 A2 20010329; WO 0122163 A3 20020912
DOCDB simple family (application)
US 40111099 A 19990922; AT 00955483 T 20000811; DE 60034488 T 20000811; EP 00955483 A 20000811; JP 2001525472 A 20000811; KR 20017006429 A 20010522; TW 89118484 A 20000908; US 0022142 W 20000811