Global Patent Index - EP 1264338 A1

EP 1264338 A1 20021211 - METHOD FOR ADJUSTING AN ELECTRICAL PARAMETER ON AN INTEGRATED ELECTRONIC COMPONENT

Title (en)

METHOD FOR ADJUSTING AN ELECTRICAL PARAMETER ON AN INTEGRATED ELECTRONIC COMPONENT

Title (de)

VERFAHREN ZUR JUSTIERUNG EINES ELEKTRISCHEN PARAMETERS AUF EINER INTEGRIERTEN ELEKTRONISCHEN KOMPONENTE

Title (fr)

PROCEDE D'AJUSTAGE D'UN PARAMETRE ELECTRIQUE SUR UN COMPOSANT ELECTRONIQUE INTEGRE

Publication

EP 1264338 A1 20021211 (FR)

Application

EP 01913999 A 20010313

Priority

  • FR 0100750 W 20010313
  • FR 0003260 A 20000314

Abstract (en)

[origin: WO0169671A1] The invention concerns a method for making an integrated electronic component arranged on a substrate wafer comprising at least two metallising steps. The invention is characterised in that the value of an electrical parameter of the component is determined after a metallising step, and one of the following metallising processes is carried out with an adjusting mask selected among n predefined masks to obtain a desired value of the parameter, the selection of the adjusting mask being performed in accordance with the predetermined value of the electrical parameter.

IPC 1-7

H01L 21/66; H01L 23/66

IPC 8 full level

H01L 21/66 (2006.01); H01L 23/66 (2006.01)

CPC (source: EP US)

H01L 22/14 (2013.01 - EP US); H01L 22/20 (2013.01 - EP US); H01L 23/66 (2013.01 - EP US); H01L 2924/0002 (2013.01 - EP US)

C-Set (source: EP US)

H01L 2924/0002 + H01L 2924/00

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

DOCDB simple family (publication)

FR 2806529 A1 20010921; FR 2806529 B1 20050304; AU 3939101 A 20010924; EP 1264338 A1 20021211; US 2004023482 A1 20040205; US 7704757 B2 20100427; WO 0169671 A1 20010920

DOCDB simple family (application)

FR 0003260 A 20000314; AU 3939101 A 20010313; EP 01913999 A 20010313; FR 0100750 W 20010313; US 27650903 A 20030801