EP 1287546 A1 20030305 - PLASMA ETCHING SYSTEM
Title (en)
PLASMA ETCHING SYSTEM
Title (de)
PLASMAÄTZANLAGE
Title (fr)
INSTALLATION DE GRAVURE AU PLASMA
Publication
Application
Priority
- DE 0101777 W 20010510
- DE 10024699 A 20000518
Abstract (en)
[origin: WO0188950A1] The invention relates to a plasma etching system (5) particularly for anisotropically etching a substrate (13) by the action of a plasma (21). Said system comprises a first, especially inductively coupled plasma production device (31) which is provided with a first means (11) for generating a first high frequency electromagnetic alternating field; an etching chamber for producing a first plasma (21) from charged particles as a result of the action of said first high frequency electromagnetic alternating field on a first reactive gas with the substrate to be etched; and a first gas supply. A second upstream plasma production device (32) is connected to said first plasma production device (31). Said second plasma production device comprises a second means (20), especially a microwave generator (20), for generating a second high frequency electromagnetic alternating field; a plasma production area (33) for producing a second plasma (18) from charged particles as a result of the action of said second high frequency electromagnetic alternating field on a second reactive gas; and a second gas supply (16). The second plasma (18) thus produced can be fed to the first plasma production device (31) at least partially in the form of a reactive gas via the first gas supply (32).
IPC 1-7
IPC 8 full level
H01J 37/32 (2006.01); H01L 21/3065 (2006.01)
CPC (source: EP US)
H01J 37/321 (2013.01 - EP US); H01J 37/32247 (2013.01 - EP US)
Citation (search report)
See references of WO 0188950A1
Designated contracting state (EPC)
DE FR GB NL
DOCDB simple family (publication)
WO 0188950 A1 20011122; DE 10024699 A1 20011129; EP 1287546 A1 20030305; JP 2003533877 A 20031111; US 2002179015 A1 20021205
DOCDB simple family (application)
DE 0101777 W 20010510; DE 10024699 A 20000518; EP 01944922 A 20010510; JP 2001584454 A 20010510; US 3172602 A 20020702