EP 1297566 A2 20030402 - SUBSTRATE CLEANING APPARATUS AND METHOD
Title (en)
SUBSTRATE CLEANING APPARATUS AND METHOD
Title (de)
VERFAHREN ZUR REINIGUNG VON EINEM SUBSTRAT UND EINRICHTUNG DAFÜR
Title (fr)
APPAREIL ET PROCEDE DE NETTOYAGE DE SUBSTRAT
Publication
Application
Priority
- US 0119218 W 20010614
- US 59533600 A 20000614
Abstract (en)
[origin: WO0197270A2] A substrate (30) may be cleaned by exposing the substrate (30) to an energized stripping gas while maintaining the substrate (30) at a first temperature and exposing the substrate (30) to an energized passivating gas while maintaining the substrate (30) at a second temperature. In another version, the substrate (30) is stripped and passivated in separate chambers. A cleaning chamber (120) may be provided with a heater (320) to heat the top of the substrate (30)
IPC 1-7
IPC 8 full level
G03F 7/42 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/304 (2006.01); H01L 21/306 (2006.01); H01L 21/3065 (2006.01); H01L 21/3213 (2006.01); H01L 21/311 (2006.01)
CPC (source: EP)
G03F 7/427 (2013.01); H01L 21/02071 (2013.01); H01L 21/31138 (2013.01); H01L 21/32136 (2013.01)
Citation (search report)
See references of WO 0197270A2
Designated contracting state (EPC)
DE FI FR GB IT NL
DOCDB simple family (publication)
WO 0197270 A2 20011220; WO 0197270 A3 20030123; EP 1297566 A2 20030402; JP 2004514272 A 20040513
DOCDB simple family (application)
US 0119218 W 20010614; EP 01944538 A 20010614; JP 2002511375 A 20010614