EP 1298110 A4 20070117 - POROUS SILICON NITRIDE ARTICLE AND METHOD FOR PRODUCTION THEREOF
Title (en)
POROUS SILICON NITRIDE ARTICLE AND METHOD FOR PRODUCTION THEREOF
Title (de)
PORÖSER SILICIUMNITRID GEGENSTAND UND VERFAHREN ZU DESSEN HERSTELLUNG
Title (fr)
ARTICLE A BASE DE NITRURE DE SILICIUM POREUX ET SON PROCEDE DE PRODUCTION
Publication
Application
Priority
- JP 0202825 W 20020325
- JP 2001087912 A 20010326
Abstract (en)
[origin: EP1298110A1] A silicon nitride porous body which is obtained by nitriding a molded body having metallic silicon as a main component and by performing a high temperature heating treatment at a temperature higher than the nitriding temperature, and which has a porous structure with an average pore diameter of 3 mu m or above, and contains at least one kind of element selected from the group consisting of the groups 2A, 3A, 3B inclusive of lanthanoid elements, and 4B. The silicon nitride porous body has a porous structure with a large average pore diameter, a test specimen cut out from the porous body exhibiting a high thermal conductivity and a small thermal expansion coefficient, and can be suitably used in a component for purifying gas and/or solution such as a ceramic filter.
IPC 1-7
IPC 8 full level
B01D 39/20 (2006.01); B01D 53/22 (2006.01); B01D 53/86 (2006.01); B01D 53/94 (2006.01); B01D 71/02 (2006.01); B01J 27/24 (2006.01); B01J 32/00 (2006.01); B01J 35/04 (2006.01); C04B 35/584 (2006.01); C04B 35/591 (2006.01); C04B 38/00 (2006.01)
CPC (source: EP US)
B01D 39/2068 (2013.01 - EP US); B01D 53/228 (2013.01 - EP US); B01D 67/0041 (2013.01 - EP); B01D 67/00411 (2022.08 - US); B01D 67/0044 (2013.01 - EP US); B01D 67/0046 (2013.01 - EP US); B01D 67/0069 (2013.01 - EP US); B01D 71/02 (2013.01 - EP); B01D 71/0215 (2022.08 - US); B01J 27/24 (2013.01 - EP US); B01J 35/56 (2024.01 - EP US); C04B 35/591 (2013.01 - EP US); C04B 38/0025 (2013.01 - EP US); B01D 2325/02 (2013.01 - EP US); B01D 2325/10 (2013.01 - EP US); B01D 2325/22 (2013.01 - EP US); C04B 2111/00793 (2013.01 - EP US); F01N 2330/00 (2013.01 - EP US); F01N 2330/30 (2013.01 - EP US)
C-Set (source: EP US)
Citation (search report)
- [PX] EP 1167321 A2 20020102 - ASAHI GLASS CO LTD [JP]
- [X] EP 0784038 A2 19970716 - SUMITOMO ELECTRIC INDUSTRIES [JP]
- [XA] US 5928601 A 19990727 - MIYAKE KAZUMI [JP], et al
- [X] GB 2010915 A 19790704 - FIAT SPA
- See also references of WO 02076908A1
Designated contracting state (EPC)
BE DE FR
DOCDB simple family (publication)
EP 1298110 A1 20030402; EP 1298110 A4 20070117; EP 1298110 B1 20100106; DE 60234984 D1 20100225; JP 2002284586 A 20021003; JP 4473463 B2 20100602; US 2003186801 A1 20031002; US 6846764 B2 20050125; WO 02076908 A1 20021003; ZA 200209816 B 20031203
DOCDB simple family (application)
EP 02705468 A 20020325; DE 60234984 T 20020325; JP 0202825 W 20020325; JP 2001087912 A 20010326; US 31171402 A 20021219; ZA 200209816 A 20021203