Global Patent Index - EP 1301830 A2

EP 1301830 A2 20030416 - METHOD FOR CHARACTERIZING OPTICAL SYSTEMS USING HOLOGRAPHIC RETICLES

Title (en)

METHOD FOR CHARACTERIZING OPTICAL SYSTEMS USING HOLOGRAPHIC RETICLES

Title (de)

VERFAHREN ZUR CHARAKTERISIERUNG OPTISCHER SYSTEME UNTER VERWENDUNG HOLOGRAPHISCHER RETIKEL

Title (fr)

SYSTEME ET PROCEDES POUR CARACTERISER DES SYSTEMES OPTIQUES A L'AIDE DE RETICULES HOLOGRAPHIQUES

Publication

EP 1301830 A2 20030416 (EN)

Application

EP 01957171 A 20010719

Priority

  • US 0122518 W 20010719
  • US 21918700 P 20000719

Abstract (en)

[origin: WO0206899A2] Characterization of an optical system is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space. A reticle and image plane are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets thereon, including periodic patterns or gratings, is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations can be determined. The present invention is particularly applicable to semiconductor manufacturing and phototithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space. In embodiments, the test reticle is holographically generated by interfering two or more beams of optical radiation. The resulting interference pattern is recorded on a reticle and used for testing the optical system. The geometry of the holographic interference pattern is tightly controlled by the properties of the interfering beams and is therefore more accurate than conventional reticle writing techniques.

IPC 1-7

G03F 7/20

IPC 8 full level

G03F 1/08 (2006.01); G02B 27/18 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP KR)

G03F 1/44 (2013.01 - KR); G03F 7/70283 (2013.01 - KR); G03F 7/706 (2013.01 - EP KR); G03F 7/70616 (2013.01 - EP); G03F 7/70741 (2013.01 - KR); G11B 7/0065 (2013.01 - KR)

Citation (search report)

See references of WO 0206899A2

Designated contracting state (EPC)

DE FR GB IT NL

DOCDB simple family (publication)

WO 0206899 A2 20020124; WO 0206899 A3 20020620; AU 7894101 A 20020130; EP 1301830 A2 20030416; JP 2004504634 A 20040212; JP 4599029 B2 20101215; KR 100886897 B1 20090305; KR 100956670 B1 20100510; KR 20020072531 A 20020916; KR 20080091263 A 20081009

DOCDB simple family (application)

US 0122518 W 20010719; AU 7894101 A 20010719; EP 01957171 A 20010719; JP 2002512746 A 20010719; KR 20027003556 A 20020318; KR 20087020900 A 20010719