EP 1307600 A4 20070124 - METHOD FOR REDUCING THE OXYGEN AND OXIDE CONTENT IN COBALT TO PROCUCE COBALT SPUTTERING TARGETS
Title (en)
METHOD FOR REDUCING THE OXYGEN AND OXIDE CONTENT IN COBALT TO PROCUCE COBALT SPUTTERING TARGETS
Title (de)
VERFAHREN ZUR REDUKTION VON SAUERSTOFF- UND OXIDGEHALT IN KOBALTZUR HERSTELLUNG VON KOBALT-SPUTTERINGTARGETS
Title (fr)
PROCEDE POUR REDUIRE LA TENEUR EN OXYGENE ET EN OXYDE DU COBALT POUR PRODUIRE DES CIBLES DE COBALT POUR LA PULVERISATION CATHODIQUE
Publication
Application
Priority
- US 0124396 W 20010803
- US 22279500 P 20000803
Abstract (en)
[origin: WO0212577A1] The present invention relates to producing cobalt having a low oxygen and a low oxide inclusion content for use as a sputter target thereby reducing the arcing and metal defects during sputtering commonly associated with high-oxygen cobalt sputter targets. Notably, the method for reducing the oxygen content and the oxide inclusion content in cobalt are separate processes which may be combined in successive order to procuce a low-oxygen cobalt sputter target having a low oxide inclusion content. The reduction in oxygen content preferably is performed prior to reducing the oxide inclusion content. Accordingly, the artisan will appreciate that one process can be performed without the other depending upon whether a reduction in oxygen or oxide inclusions is preferred in a desired cobalt sputter target.
IPC 8 full level
C22B 23/06 (2006.01); C22C 1/02 (2006.01); C22C 1/06 (2006.01); C22C 19/05 (2006.01); C22C 19/07 (2006.01); C23C 14/34 (2006.01)
CPC (source: EP KR)
C22B 23/06 (2013.01 - EP KR); C22C 1/02 (2013.01 - EP); C22C 19/053 (2013.01 - EP); C22C 19/055 (2013.01 - EP); C22C 19/056 (2013.01 - EP); C22C 19/058 (2013.01 - EP); C23C 14/3414 (2013.01 - EP)
Citation (search report)
- [X] WO 9910548 A1 19990304 - ALTA GROUP INC [US], et al
- [X] JP H07252565 A 19951003 - MITSUBISHI STEEL MFG
- [A] GB 1288189 A 19720906
- [A] JP 2000129399 A 20000509 - NISSHIN STEEL CO LTD
- See references of WO 0212577A1
Designated contracting state (EPC)
DE FR GB IE IT
DOCDB simple family (publication)
WO 0212577 A1 20020214; EP 1307600 A1 20030507; EP 1307600 A4 20070124; KR 20030019645 A 20030306
DOCDB simple family (application)
US 0124396 W 20010803; EP 01963786 A 20010803; KR 20037001516 A 20030203