EP 1309896 A2 20030514 - SHADOW MASK AND METHOD FOR PRODUCING A SHADOW MASK
Title (en)
SHADOW MASK AND METHOD FOR PRODUCING A SHADOW MASK
Title (de)
LOCHMASKE UND VERFAHREN ZUR HERSTELLUNG EINER LOCHMASKE
Title (fr)
MASQUE A TROUS ET PROCEDE DE REALISATION D'UN MASQUE A TROUS
Publication
Application
Priority
- DE 10039644 A 20000814
- EP 0109405 W 20010814
Abstract (en)
[origin: WO0214951A2] The invention relates to a shadow mask for particle rays, particularly ion rays comprising a silicon chip with a pattern therein, characterised in that the silicon chip has a metal coating on the side orientated towards the incident ion rays which stops said rays and dissipates heat. Also, disclosed is a method for producing the shadow mask.
IPC 1-7
IPC 8 full level
CPC (source: EP US)
G03F 1/20 (2013.01 - EP US)
Citation (search report)
See references of WO 0214951A2
Designated contracting state (EPC)
AT BE CH CY DE FR GB IT LI
DOCDB simple family (publication)
WO 0214951 A2 20020221; WO 0214951 A3 20020919; DE 10039644 A1 20020228; EP 1309896 A2 20030514; US 2004219465 A1 20041104; US 7183043 B2 20070227
DOCDB simple family (application)
EP 0109405 W 20010814; DE 10039644 A 20000814; EP 01967274 A 20010814; US 34471003 A 20031010