EP 1319637 A2 20030618 - Synthetic quartz glass blank
Title (en)
Synthetic quartz glass blank
Title (de)
Ein Rohling aus Quarzglas
Title (fr)
Une ebauche en verre de silice
Publication
Application
Priority
JP 2001376646 A 20011211
Abstract (en)
A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950 DEG C each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1x10<-6>. The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.
IPC 1-7
IPC 8 full level
C03B 19/14 (2006.01); C03C 3/06 (2006.01)
CPC (source: EP US)
C03B 19/1423 (2013.01 - EP US); C03B 19/1453 (2013.01 - EP US); C03B 19/1469 (2013.01 - EP US); C03C 3/06 (2013.01 - EP US); C03B 2201/21 (2013.01 - EP US); C03B 2201/23 (2013.01 - EP US); C03B 2207/06 (2013.01 - EP US); C03B 2207/20 (2013.01 - EP US); C03B 2207/32 (2013.01 - EP US); C03C 2201/21 (2013.01 - EP US); C03C 2201/23 (2013.01 - EP US); Y02P 40/57 (2015.11 - EP US); Y10T 428/21 (2015.01 - EP US); Y10T 428/2913 (2015.01 - EP US)
Citation (applicant)
- JP H07267662 A 19951017 - SHINETSU QUARTZ PROD, et al
- JP H0761823 A 19950307 - NIKON CORP
- JP H02102139 A 19900413 - SHINETSU SEKIEI KK
- JP H02239127 A 19900921 - SHINETSU SEKIEI KK
- JP H0558667 A 19930309 - SHINETSU QUARTZ PROD
- JP 2001376646 A
- ZHURNAL PRIKLAND NOI SPEKTROSKOPII, vol. 46, no. 6, 1987, pages 987 - 991
- THE AMERICAN PHYSICAL SOCIETY, vol. 28, no. 6, September 1983 (1983-09-01), pages 3266 - 3271
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
EP 1319637 A2 20030618; EP 1319637 A3 20040128; US 2003138587 A1 20030724; US 6761951 B2 20040713
DOCDB simple family (application)
EP 02258524 A 20021211; US 31599002 A 20021211