EP 1320441 A1 20030625 - CMP APPARATUS AND METHODS TO CONTROL THE TILT OF THE CARRIER HEAD, THE RETAINING RING AND THE PAD CONDITIONER
Title (en)
CMP APPARATUS AND METHODS TO CONTROL THE TILT OF THE CARRIER HEAD, THE RETAINING RING AND THE PAD CONDITIONER
Title (de)
CMP VORRICHTUNG UND VERFAHREN ZUR STEUERUNG DER NEIGUNG DES TRÄGERKOPFS, DES HALTERRINGS UND DES ABRICHTKOPFS
Title (fr)
APPAREIL DE POLISSAGE CHIMICO-MECANIQUE ET PROCEDES DE REGLAGE D'INCLINAISON DE LA TETE DE SUPPORT, DE LA BAGUE DE RETENUE ET DU CONDITIONNEUR DE PLOT
Publication
Application
Priority
- US 0129799 W 20010921
- US 66866700 A 20000922
- US 66870500 A 20000922
Abstract (en)
[origin: WO0224410A1] A CMP system make repeatable measurements of eccentric forces applied to carriers for wafer or conditioning pucks. Force applied to the carrier may be accurately measured even though such force is eccentrically applied to such carrier. An initial coaxial relationship between an axis of rotation and a carrier axis (212) is maintained during application of the eccentric force (FP-W), such that a sensor (263) is enabled to make repeatable measurements, of the eccentric forces, and the carrier (208) may be a wafer or a puck carrier. Such initial coaxial relationship is maintained by alinear bearing assembly (232) mounted between the carrier (208) and thsensor (263). The linear bearing assembly is provided as an array of separate linear bearing assemblies, wherein each separate linear bearing assembly is dimensioned independently of the diameter, of a wafer or puck carried by the carrier. The linear bearing assembly may be assembled with a retainer ring (282).
IPC 1-7
IPC 8 full level
B24B 37/00 (2006.01); B24B 37/04 (2006.01); B24B 41/04 (2006.01); B24B 41/06 (2006.01); B24B 49/16 (2006.01); B24B 53/007 (2006.01); H01L 21/304 (2006.01); H01L 21/306 (2006.01)
CPC (source: EP KR)
B24B 37/04 (2013.01 - EP); B24B 41/04 (2013.01 - EP); B24B 41/061 (2013.01 - EP); B24B 53/017 (2013.01 - EP); H01L 21/304 (2013.01 - KR); H01L 21/30625 (2013.01 - EP)
Citation (search report)
See references of WO 0224410A1
Designated contracting state (EPC)
BE DE FR GB
DOCDB simple family (publication)
WO 0224410 A1 20020328; WO 0224410 A9 20030327; AU 9121801 A 20020402; EP 1320441 A1 20030625; JP 2004508962 A 20040325; KR 20030048407 A 20030619; TW 528651 B 20030421
DOCDB simple family (application)
US 0129799 W 20010921; AU 9121801 A 20010921; EP 01971321 A 20010921; JP 2002528461 A 20010921; KR 20037004168 A 20030321; TW 90123695 A 20010921